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Wear-resistant membrane structure, die and manufacturing method thereof

A technology of thin film structure and manufacturing method, applied in gaseous chemical plating, metal material coating process, layered products, etc., can solve the problems of diamond-like carbon layer peeling and other problems

Active Publication Date: 2010-09-15
KINIK
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] Another object of the present invention is to provide a mold that uses the above-mentioned film structure to solve the problem that the diamond-like carbon layer in the prior art is easily peeled off from the substrate of the mold due to internal stress.

Method used

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  • Wear-resistant membrane structure, die and manufacturing method thereof
  • Wear-resistant membrane structure, die and manufacturing method thereof
  • Wear-resistant membrane structure, die and manufacturing method thereof

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Embodiment Construction

[0030] figure 1 It is a structural schematic diagram of a mold according to an embodiment of the present invention. see figure 1 , the mold 10 includes a wear-resistant film structure 100 and a substrate 21 , and the wear-resistant junction film structure 100 is disposed on the substrate 21 . The wear-resistant thin film structure 100 includes an intermediate layer 22, a progressive layer 23 and a type of diamond carbon layer 24, wherein the intermediate layer 22 is located on the substrate 21, the progressive layer 23 is located on the intermediate layer 22, and the diamond-like carbon layer 24 is located on the progressive layer. layer 23, and the sheet material of the substrate 21 includes any metal or non-metal sheet material.

[0031] In this embodiment, the intermediate layer 22 and the progressive layer 23 are sequentially disposed on the substrate 21 , and the material thereof includes carbon, hydrogen and silicon. However, it should be noted that the silicon conten...

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Abstract

The invention discloses a wear-resistant membrane structure, which comprises a middle layer, a gradual layer and a diamond like carbon layer, wherein the gradual layer is formed on the middle layer, and the diamond like carbon layer is formed on the gradual layer and the diamond like carbon layer comprises an adulterant. The adulterant is added into the diamond like carbon layer to reduce the internal stress and the frictional coefficient of the diamond like carbon layer. The invention also discloses a die using the membrane structure and a manufacturing method thereof. The atomic structures of the middle layer and the gradual layer are similar to those of a base plate and the diamond like carbon layer respectively, so the diamond like carbon layer is difficult to be peeled off from the base plate through the design of the middle layer and the gradual layer. Besides, the elements such as hydrogen, fluorine, nitrogen, silicon and the like are added into the diamond like carbon layer toreduce the internal stress and the frictional coefficient of the diamond like carbon layer.

Description

technical field [0001] The invention relates to a film structure, in particular to a wear-resistant film structure, a mold using the film structure and a manufacturing method thereof. Background technique [0002] A carbon film with both sp2 and sp3 mixed orbitals is called a diamond-like carbon (DLC) film. The characteristics of the diamond-like carbon film are similar to those of natural diamonds. In addition to high hardness and high insulation, it is resistant to acid , Alkali, heat have very good resistance. At the same time, the diamond-like carbon surface of the amorphous structure can reach the nanometer level, which has the effect of low friction coefficient, so that it can avoid wear under relative motion. Due to the characteristics of wear resistance, corrosion resistance and radiation resistance of diamond-like carbon film, at the same time, it can be made into various complex shapes and coated on the surface of the workpiece for protection, lubrication, heat di...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/04B32B7/02C23C16/22C23C16/455
Inventor 甘明吉陈嘉延宋健民胡绍中
Owner KINIK
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