Production method of part for improving nanometer array structure on insulating substrate

Abstract

The invention discloses a production method of a part for improving a nanometer array structure on an insulating substrate, which is characterized by comprising the following steps that: photoetching a semiconductor part on an insulating substrate and performing a first-time mesa etching to form a stepping sample structure; producing a micro-structure mask layer on a mesa above a step; and then performing the second-time mesa etching, and at the same time forming a nanometer array structure through etching. Mesa of an n area (or a p area) is formed through two-step etching, and the micro-structure mask is produced on the upper mesa which is relatively high, so the electrode area of the lower mesa can be prevented from producing rough peak-shaped projection during the etching process, the method is simple and rapid, an the universality is strong. By improving the roughness of the electrode area, the adhesion of the metal electrode which is subsequently deposited can be strengthened, so the metal electrode is difficult to be stripped, the reliability of the part can be improved, and other subsequent process (such as bonding) can be conveniently performed.

Description

technical field [0001] The invention relates to the field of semiconductor technology, in particular to the manufacturing technology of semiconductor nano-array structure devices (such as solar cells, LEDs, photodetectors, lasers, etc.). Background technique [0002] With the continuous development of semiconductor technology and the continuous improvement of the processing level, nano-scale devices have received widespread attention, including solar cells, LEDs, photodetectors, and lasers based on nano-array structures. [0003] Compared with thin-film devices, nanoarray-structured devices have many advantages. The nano-array structure can increase the surface area of ​​the device, release stress, reduce lattice mismatch, and terminate dislocations. In addition, for LEDs, the use of nano-array structures can effectively improve light extraction efficiency, thereby increasing light output power; for solar cells, photodetectors, etc., the use of nano-array structures can red...

AI Technical Summary

Problems solved by technology

On the one hand, these protrusions are not conducive to the subsequent deposition of metal electrodes and reduce the adhesion; on the other hand, if there are subsequent processes such as wafer bonding and Ag-plated mirrors in the device manufacturing process, the existence of surface protrusions will unfavorable for these processes

Images