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Method for producing trichlorosilane

A technology of trichlorosilane and a production method, which is applied in directions such as halogenated silanes, halogenated silicon compounds, etc., can solve the problems of high cost, low yield of trichlorosilane, complicated equipment and the like

Inactive Publication Date: 2010-12-08
湖北新蓝天新材料股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] This method usually has a very low yield of trichlorosilane due to the high water content in the hydrogen chloride gas
In the second issue of 2010 "Chlor-Alkali Industry" magazine published in February 2010, the relationship between the water content in hydrogen chloride and the yield of trichlorosilane was introduced: when the mass fraction of water in hydrogen chloride was 0.05%, trichlorosilane The synthesis yield can reach 90%, but when the mass fraction of water in the hydrogen chloride is 0.2%, the synthesis yield of trichlorosilane is only 70%.
Although this treatment method can ensure that the hydrogen chloride water mass fraction entering the trichlorosilane fluidized furnace is lower than 0.1%, the equipment is complicated and the cost is high

Method used

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  • Method for producing trichlorosilane
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Effect test

Embodiment 1

[0032] A production method of trichlorosilane, which produces trichlorosilane by reacting hydrogen chloride and silicon powder in a fluidized furnace, before hydrogen chloride gas enters the fluidized furnace, it enters a mixer, and silicon tetrachloride is added into the mixer, two kinds of gases The volume ratio of hydrogen chloride: silicon tetrachloride gas = 8: 1, the two kinds of gas are fully mixed at 60 ~ 80 ° C, the silicon tetrachloride gas and the water in the mixed gas react to form silicon dioxide, after removing the silicon dioxide The gas enters the boiling furnace and reacts with silicon powder to form trichlorosilane.

[0033] In the above-mentioned production method of trichlorosilane, the moisture in the gas coming out from the mixer is 35ppm, and in the resulting system after the reaction is completed, SiHCl 3 The content is 85.4%, SiCl 4 The content is 10.2%.

Embodiment 2

[0035] A production method of trichlorosilane, which produces trichlorosilane by reacting hydrogen chloride and silicon powder in a fluidized furnace, before hydrogen chloride gas enters the fluidized furnace, it enters a mixer, and silicon tetrachloride is added into the mixer, two kinds of gases The volume ratio of hydrogen chloride: silicon tetrachloride gas = 9: 1, the two gases are fully mixed at 60 ~ 80 ° C, the silicon tetrachloride gas and the water in the mixed gas react to form silicon dioxide, after removing the silicon dioxide The gas enters the boiling furnace and reacts with silicon powder to form trichlorosilane.

[0036] In the above-mentioned production method of trichlorosilane, the moisture in the gas coming out from the mixer is 40ppm, and in the resulting system after the reaction is completed, SiHCl 3 The content is 87.6%, SiCl 4 The content is 9.6%.

Embodiment 3

[0038] A kind of production method of trichlorosilane, produces trichlorosilane by reacting hydrogen chloride and silicon powder in fluidized furnace, before hydrogen chloride gas enters into fluidized furnace, first enters mixer, adds silicon tetrachloride and hydrogen into mixer, makes The volume ratio of the three gases is hydrogen chloride: silicon tetrachloride gas: hydrogen = 8:1:0.5, the three gases are fully mixed at 60-80 °C, and the silicon tetrachloride gas reacts with the water in the mixed gas to form carbon dioxide Silicon, after removing silicon dioxide, the gas enters the fluidized furnace and reacts with silicon powder to form trichlorosilane.

[0039] In the above-mentioned production method of trichlorosilane, the moisture in the gas coming out from the mixer is 38ppm, and in the resulting system after the reaction is completed, SiHCl 3 The content is 92.5%, SiCl 4 The content is 5.2%.

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Abstract

The invention relates to a method for producing trichlorosilane. The method comprises the following steps of: performing a reaction on hydrogen chloride and silicon powder in a fluidized bed furnace to produce trichlorosilane; allowing hydrogen chloride gas to enter a mixer before entering the fluidized bed furnace; adding silicon tetrachloride and hydrogen into the mixer; fully mixing three gases at the temperature of between 60 and 80 DEG C; performing a reaction on silicon tetrachloride and mixed gas in water to generate silicon dioxide; removing the silicon dioxide by using a silicon dioxide separator; and allowing the mixed gas to enter the fluidized bed furnace and react with silicon to generate the trichlorosilane.

Description

technical field [0001] The invention relates to a production method of trichlorosilane. Background technique [0002] Trichlorosilane (SiCl 3 ) is the main raw material for the preparation of high-purity polysilicon. The commonly used production method of trichlorosilane is to react hydrogen chloride and silicon powder in a fluidized furnace, the reaction temperature is 280-320 degrees Celsius, and the reaction formula is: [0003] Si+3HCl-----------------SiHCl 3 +H 2 [0004] This method usually has a very low yield of trichlorosilane due to the high water content in the hydrogen chloride gas. In the second issue of 2010 "Chlor-Alkali Industry" magazine published in February 2010, the relationship between the water content in hydrogen chloride and the yield of trichlorosilane was introduced: when the mass fraction of water in hydrogen chloride was 0.05%, trichlorosilane The synthesis yield can reach 90%, but when the mass fraction of water in the hydrogen chloride is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 肖俊平
Owner 湖北新蓝天新材料股份有限公司