Automatic focusing method and device for lithography machine

A technology of automatic focusing and lithography, which is applied in opto-mechanical equipment, optics, instruments, etc., and can solve the problems of small measurement range, low measurement accuracy, and complex structure.
CN101968607BActive Publication Date: 2013-01-02HUAZHONG UNIV OF SCI & TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HUAZHONG UNIV OF SCI & TECH
Publication Date
2013-01-02

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Abstract

The invention discloses an automatic focusing method and an automatic focusing device for a lithography machine. The method comprises the following steps of: projecting parallel beams onto the surface of a silicon wafer through a first slit; scanning the beams by a vibration reflector and making the beams pass a second slit; receiving a light intensity signal by a photoelectric detector; extracting frequency domain components of which the frequency is 2 times scanning frequency from the light intensity signal to obtain the coarse tuning amount of the silicon wafer; extracting frequency domaincomponents of which the frequency is doubling the scanning frequency from the light intensity signal to obtain the fine tuning amount of the silicon wafer; and adjusting the silicon wafer to a focus position by a driving device. The focusing device mainly comprises the two slits, the vibration reflector, a photoelectric sensor, a drive platform and a plurality of optical lenses; and the signal processing procedure is finished by computer programming. Compared with the conventional focusing method by comparing the intensities of light spots, the method and the device have the characteristics of simple structure, quick response, high precision (higher than 0.1 microns) and strong antijamming capability.
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Description

technical field

[0001] The invention belongs to the technical field of automatic focusing of photolithography machines and photoelectric detection, and in particular relates to an automatic focusing method and device of photolithography machines. Background technique

[0002] With the vigorous development of the electronic industry, the application of integrated circuits has become more and more extensive, and the high precision of its production has also received more attention. Lithography machine is the most critical equipment in all links of integrated circuit production. Lithography technology is the basis of large-scale integrated circuit manufacturing and the core driving force to promote the development of integrated circuits. Graphics are imaged on silicon wafers. Since the surface of the silicon wafer is coated with photosensitive photoresist, when the pattern on the mask plate is imaged on the silicon wafer, the photoresist at the corresponding position will prod...

Claims

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