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Method for improving uniformity in diffusion film resistance chip of solar cell

A technology of solar cells and thin film resistors, applied in circuits, electrical components, climate sustainability, etc., can solve the problems of furnace tube heat balance point difference, furnace wire failure, cumbersome replacement, etc., to achieve low cost maintenance and good uniformity , the effect of high conversion efficiency

Active Publication Date: 2012-07-25
TRINA SOLAR CO LTD
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  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0004] The disadvantages of the existing technology are: the furnace body of the horizontal diffusion furnace tube is due to the difference in the processing technology of the heating wire. The cost of repurchasing or maintaining the heating furnace body is higher
It is also cumbersome to replace

Method used

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  • Method for improving uniformity in diffusion film resistance chip of solar cell
  • Method for improving uniformity in diffusion film resistance chip of solar cell
  • Method for improving uniformity in diffusion film resistance chip of solar cell

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Experimental program
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Embodiment Construction

[0023] Such as figure 1 As shown, the solar cell has a silicon chip 3, and the silicon chip 3 is placed on the quartz boat 2 through a slot in the quartz boat 2, and the quartz boat 2 with the silicon chip 3 is placed in the diffusion furnace tube 1, and the diffusion furnace tube 1 is heated The silicon wafer 3 is diffused.

[0024] Embodiments of the invention:

[0025] A method for improving the uniformity of solar cell diffused thin film resistors:

[0026] i. The silicon wafer 3 obtained after being diffused by the diffusion furnace tube 1 is subjected to the diffusion film resistance distribution test: the test point is set on the silicon wafer 3, the test point a is at the lower left of the silicon wafer 3, and the test point is at the lower right of the silicon wafer 3 b, the center of silicon wafer 3 is test point c, the upper left of silicon wafer 3 is test point d, and the upper right of silicon wafer 3 is test point e;

[0027] ii. According to the diffusion fil...

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Abstract

The invention relates to a method for improving uniformity in a diffusion film resistance chip of a solar cell, which comprises the following steps of: i, performing diffusion film resistance distribution test on a silicon chip diffused by a diffusion furnace tube; ii, obtaining diffusion film distribution test data according to the diffusion film resistance distribution test; and iii, adjusting the supporting leg height h or the clamping groove position of a quartz boat according to the diffusion film distribution test data of the silicon chip. The position of the silicon chip on the quartz boat is adjusted by adjusting the supporting leg height and the clamping groove position of the quartz boat so that the silicon chip is positioned at a heat balance point of the diffusion furnace tube, four sides of the silicon chip are heated uniformly, the uniformity in the diffusion film resistance chip of the solar cell is good, and the conversion efficiency of the solar cell is high.

Description

technical field [0001] The invention relates to a method for improving the internal uniformity of a solar cell diffused thin film resistor sheet. Background technique [0002] Solar cells use the principle of photovoltaic effect to convert solar radiation energy into electrical energy. Solar cells are essentially diodes with large-area semiconductor PN junctions. Diffusion technology on silicon substrates using horizontal diffusion furnace tubes is the core technology for making PN junctions of solar cells. The level of its technology directly affects the photoelectric conversion efficiency of solar cells. The uniformity of thin film resistance in a single silicon wafer is an important index to measure the diffusion effect of the horizontal diffusion furnace tube. Therefore, how to improve the uniformity of the thin film resistance in the silicon wafer after diffusion is a topic that people in the industry pay close attention to. [0003] In the solar cell manufacturing p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 王庆钱
Owner TRINA SOLAR CO LTD
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