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Method for preparing single-layer high-activity titanium dioxide thin film

A titanium dioxide, high-activity technology, applied in the coating process of metal materials, etc., can solve the problems that titanium dioxide powder is difficult to make dense and strong films, limit applications, and the photocatalytic efficiency of titanium dioxide cannot be satisfied, etc., to achieve controllable film thickness , enhance the transfer efficiency, combined with a firm effect

Active Publication Date: 2011-04-20
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because titanium dioxide is non-toxic, harmless, environmentally friendly and cheap, in addition to being used in photocatalytic water splitting, it is also widely used in photodegradation, dye-sensitized solar cells, photoelectrochemistry, biochemistry, and self-cleaning. However, titanium dioxide photocatalysis Efficiency still does not meet the needs of the application
How to prepare titanium dioxide with a dominant (001) crystal plane has become the focus of research, and it has recently been reported that TiF 4 Titanium dioxide crystals with dominant (001) crystal planes are prepared as precursors, but the titanium dioxide crystals with dominant (001) crystal planes prepared by this method are powders with a particle size greater than 1 μm, so this (001) dominant titanium dioxide powder is very difficult. Difficult to be made into dense and robust films, which limits its effective applications in photoelectrodes, dye-sensitized solar cells, self-cleaning surfaces, etc.

Method used

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  • Method for preparing single-layer high-activity titanium dioxide thin film
  • Method for preparing single-layer high-activity titanium dioxide thin film
  • Method for preparing single-layer high-activity titanium dioxide thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The 0.25mm×10mm×30mm titanium sheet was ultrasonically cleaned with absolute ethanol and deionized water respectively, and after vacuum drying at 80°C, a clean titanium sheet without an oxide layer on the surface was obtained. Then, put the clean titanium sheet into an 80 mL stainless steel reaction kettle lined with polytetrafluoroethylene and filled with 40 mL of 10 mM dilute hydrofluoric acid aqueous solution. After the reaction kettle is sealed, put it into an oven for heat treatment at 140°C for 10 hours, take out the reacted titanium sheet, wash it with deionized water and dry it at 80°C to obtain a titanium sheet with a single-layer (001) crystal plane titanium dioxide film formed on the surface .

[0029] Such as figure 1 As shown, the exposed surface of the titanium dioxide film formed on the titanium sheet is a highly active (001) crystal plane, the film is composed of tooth-like titanium dioxide crystal particles, the particle size is 130nm, and the film has...

Embodiment 2

[0035] The 0.25mm×10mm×30mm titanium sheet was ultrasonically cleaned with absolute ethanol and deionized water respectively, and after vacuum drying at 80°C, a clean titanium sheet without an oxide layer on the surface was obtained. Then, put the clean titanium sheet into an 80 mL stainless steel reaction kettle lined with polytetrafluoroethylene and filled with 40 mL of 8 mM dilute hydrofluoric acid aqueous solution. After the reaction kettle is sealed, put it into an oven for heat treatment at 120°C for 10 hours, take out the reacted titanium sheet, wash it with deionized water and dry it at 80°C to obtain a titanium sheet with a single-layer (001) crystal plane titanium dioxide film formed on the surface .

[0036] Such as Figure 6 As shown, the titanium dioxide (001) crystal film synthesized under this condition, the obtained film is titanium dioxide crystal, the size of the titanium dioxide crystal particle is 300nm, the film is composed of titanium dioxide of anatase ...

Embodiment 3

[0038] Ultrasonic cleaning of 0.2 g of titanium ingots with absolute ethanol and deionized water respectively, followed by vacuum drying at 80° C., to obtain clean titanium ingots without an oxide layer on the surface. Then, put the clean titanium block into an 80 mL stainless steel reaction kettle lined with polytetrafluoroethylene and filled with 40 mL of 15 mM dilute hydrofluoric acid aqueous solution. After the reaction kettle is sealed, put it into an oven for heat treatment at 140°C for 15 hours, take out the reacted titanium block, wash it with deionized water and dry it at 100°C to obtain a titanium block with a single-layer (001) crystal plane titanium dioxide film formed on the surface .

[0039] Such as Figure 7As shown, the titanium dioxide (001) crystal film synthesized under this condition, the obtained film is titanium dioxide crystal, the size of the titanium dioxide crystal particle is 120nm, the film is composed of titanium dioxide of anatase and rutile pha...

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Abstract

The invention relates to a preparation method for forming single-layer high-activity (001) crystal surface dominating titanium dioxide thin films on different substrates, in particular to the method for growing the (001) crystal surface dominating titanium dioxide thin film consisting of single-layer titanium dioxide particles on a metallic titanium or titanium alloy substrate by a wet chemical process, which solves the problems that (001) dominating titanium dioxide powder difficultly forms a (001) plane totally positioned on a surface and that a compact thin film is difficult to form. In the method, the substrate is placed into a reaction kettle containing the aqueous solution of hydrofluoric acid, and heating treatment is performed at 100 to 200 DEG C for 6 to 24 h to obtain the single-layer (001) crystal surface dominating titanium dioxide thin film. The single-layer (001) crystal surface dominating titanium dioxide thin film consists of anatase and rutile in the radio of 95:5 to 80:20, has the thickness of 10 to 1,000 nm, the controllable (001) crystal surface ratio of 20 to 91 percent and high photoelectrochemical decomposition of water, and is expected to be widely and effectively applied to photocatalytic devices.

Description

technical field [0001] The invention relates to a preparation method for forming a single-layer highly active (001) crystal plane-dominated titanium dioxide film on different substrates, specifically a kind of titanium dioxide film composed of a single layer of titanium dioxide particles grown on a metal titanium or titanium alloy substrate through a wet chemical process ( 001) A method for crystal plane-predominant titanium dioxide thin films. Background technique [0002] Since Fujishima discovered in 1972 that titanium dioxide can split water to produce hydrogen under the action of light, titanium dioxide and other semiconductor compounds that can be used for photocatalytic water splitting to produce hydrogen have attracted widespread attention and in-depth research. Because titanium dioxide is non-toxic, harmless, environmentally friendly and cheap, in addition to being used in photocatalytic water splitting, it is also widely used in photodegradation, dye-sensitized sol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C22/34
Inventor 成会明王学文刘岗潘剑李峰逯高清
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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