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Ceramic coating and method of making the same

A technology of ceramic coating and equipment, which is applied in the field of conductive ceramic coating and its preparation, and can solve problems such as discomfort

Inactive Publication Date: 2011-05-04
GENERAL ELECTRIC CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Such high thickness values ​​are not suitable for applications such as photovoltaic

Method used

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  • Ceramic coating and method of making the same
  • Ceramic coating and method of making the same
  • Ceramic coating and method of making the same

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Embodiment

[0029] Different ceramic coatings are produced using HVOF and plasma spraying. The HVOF gun used in this experiment is a DJ3600 gun (Sulzer Metco). The plasma gun is a Mettech axial feed gun. In each coating, slurries were prepared by milling ITO powder in ethanol and yttrium stabilized zirconia (YSZ) milling media for milling times ranging from about 18 hours to about 140 hours. The slurry was diluted with ethanol to a concentration of 10% by weight before thermal spraying. The slurry was milled for 112.5 hours followed by a particle size distribution measurement with a d90 of about 0.33 microns. The slurry is fed into the HVOF or plasma spray gun through a pressurized vessel. The pressure of the container varies according to the needs of each gun. For example, in the case of HVOF, the combustion pressure needs to be overcome to feed the slurry into the nozzle. 90 psi was found to be a suitable pressure in this case. Plasma guns require a lower pressure of about 20psi t...

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Abstract

A method for forming a ceramic coating is provided. The method includes providing a slurry comprising a liquid and a plurality of feedstock particles disposed in the liquid, injecting the slurry into the flame of a thermal spray gun, and spraying the slurry on a surface of a substrate using the thermal spray gun to form the ceramic coating such that at least a part of the surface of the substrate is covered by the ceramic coating, wherein a thickness of the ceramic coating is in a range from about 10 nanometers to about 3 micrometers, and wherein a density of the ceramic coating is more than about 90 percent, and wherein the ceramic coating is a continuous coating.

Description

technical field [0001] In general, the present invention relates to ceramic coatings and methods for their preparation, and more particularly, to conductive ceramic coatings and methods for their preparation. Background technique [0002] Vacuum-based deposition techniques are often employed to form thin layers of conductive coatings or ceramic materials. For example, thin layers of transparent materials such as indium tin oxide are often deposited in electrical devices in the field of photovoltaics. It is desirable to deposit the thinnest possible coating for better optical transparency and current flow through the layer. Some of the currently employed methods of depositing such coatings include chemical vapor deposition (CVD), physical vapor deposition (PVD), laser assisted pyrolytic deposition, and electron beam physical vapor deposition. [0003] One current method of depositing such coatings, CVD, is a material synthesis method in which components of the gas phase rea...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/12C23C4/10
CPCC23C4/11C23C4/129C23C4/134
Inventor J·A·鲁德L·阿德尔什塔恩
Owner GENERAL ELECTRIC CO