Semiconductor device, flip-chip mounting method and flip-chip mounting apparatus
A technology of flip-chip and mounting method, which is applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., and can solve problems such as inability to improve mechanical strength, deviation in shape, and low reliability
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Embodiment approach 1
[0075] Figure 1 to Figure 15 Embodiment 1 of this invention is shown.
[0076] Figure 1 to Figure 13 Indicates the process of flip-chip mounting, Figure 13 for the completed semiconductor device.
[0077] First, explain figure 1 (a) The preceding process shown in (b).
[0078] Such as figure 1 As shown in (a), bumps 3 are provided on the electrode pads 2 of the semiconductor chip 1 . The thickness of the semiconductor chip 1 is 0.15 to 0.2 mm. The bump 3 is mainly formed of at least one of gold, copper, palladium, nickel, tin, aluminum, solder, and the like. The bumps 3 may be formed as stud bumps or tear-off bumps by a known wire bonding method, and trace elements may be added or contained in wires for forming the bumps 3 . At this time, the bump height was about 50 μm, and the pedestal diameter was 55 μm. The bump 3 can also be formed by a known plating method or printing method.
[0079] The wiring substrate 4 with a thickness of 0.2 to 0.4mm is a glass epoxy...
Embodiment approach 2
[0106] Figure 16 and Figure 17 Embodiment 2 is shown.
[0107] In Embodiment 1, the film 13 is formed on the surface of the semiconductor chip 1 side. Figure 14 The method of the concave-convex shape 13a of the wavy pattern shown above is different from that of Embodiment 2 only in the following point: the surface of the thin film 13 on the semiconductor chip 1 side is used. Figure 16 The wave-like pattern is shown by the method of the concave-convex shape 13b. Concretely, with regard to the fixed repeating pattern, when the film 13 is manufactured, the concave and convex of the grid-like pattern are formed while performing heat stamping with a roller. Figure 17 The concave-convex part (corrugated part) 16b formed in the chamfer part of the insulating resin 6 is shown. Other parts are the same as Embodiment 1.
Embodiment approach 3
[0109] Figure 18 Embodiment 3 is shown.
[0110] In Embodiment 1 and Embodiment 2, the method of forming the concave-convex shape 13a or 13b on the film 13 is used, and this is transferred to the chamfered portion of the insulating resin 6 to form the concave-convex portion (corrugated portion) 16a or 16b, On the other hand, Embodiment 3 is different only in the following points: the concave-convex portion 10 a is formed on the surface of the frame body 10 of the crimping tool 8 , and the concave-convex portion 10 a is transferred to the chamfered portion of the insulating resin 6 on the surface of the frame body 10 . to form bumps. The finished shape is with Figure 13 same. In the case of Embodiment 3, a thin film having flat surfaces on both sides without forming the concavo-convex shape 13 a on the surface of the thin film 13 on the semiconductor chip 1 side is used.
[0111] In this embodiment using the method of forming the concavo-convex portion 10a on the crimping...
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Abstract
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