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Stone agglomerate slab or flagstone with tio2 or zno coating

A technology of coalescence and mixture, applied in coating, metal material coating process, ion implantation plating, etc.

Inactive Publication Date: 2011-06-29
COSENTINO SA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The solution to this problem is to use as an adhesive another resin with high resistance to solar radiation, as described in patent document WO 2006 / 100321 A1, whose inventors are the same as the present invention, although several As described in one embodiment, the use of the adhesive will sacrifice other aesthetic and mechanical properties

Method used

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  • Stone agglomerate slab or flagstone with tio2 or zno coating
  • Stone agglomerate slab or flagstone with tio2 or zno coating
  • Stone agglomerate slab or flagstone with tio2 or zno coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Example 1: TiO with amorphous structure and different thicknesses using PECVD technique under vacuum 2 Thin films Coated quartz agglomerate plates with dimensions 300 x 150 cm and a thickness of 20 mm.

[0059] Using PECVD technology under vacuum, according to the required thickness, under the following conditions, by changing the deposition time, the TiO 2 Transparent thin films deposited on quartz agglomerate surfaces:

[0060] -Oxidizing gas (pure O) with a flow rate of 240mL / min 2 ) generated plasma.

[0061] - Time to activate the surface of the quartz agglomerate with plasma: 5 min.

[0062] - Power to form plasma: 400W, frequency 2.45GHz.

[0063] - Working pressure: 3 millitorr (mtorr).

[0064] - Volatile precursor: Titanium(IV) tetraisopropoxide impregnated in a thermostatic storage chamber at 40°C.

[0065] - O entraining vapors of volatile precursors into the plasma 2 Derivative flow rate: 2.5mL / min.

[0066] - Deposition rate: 0.9 μm / h.

[0067] ...

Embodiment 2

[0081] Example 2: Quartz agglomerate plates with dimensions of 300 × 150 × 2 cm were coated with an amorphous structure and a transparent film of ZnO with a thickness of 500 nm using the PECVD technique.

[0082] Deposition was carried out under the following conditions:

[0083] -Oxidizing gas (pure O) with a flow rate of 15mL / min 2 ) generated plasma.

[0084] - Time to activate the surface of the quartz agglomerate with plasma: 5 min.

[0085] - Formation of O 2 Plasma power: 200W, frequency 2.45GHz.

[0086] - Working pressure: 1Pa.

[0087] - Volatile precursor: Diethylzinc (Zn(Et) 2 ).

[0088] - Flow rate of volatile precursors: 5 mL / min.

[0089] - Deposition rate: 1.0 μm / h.

[0090] - Deposition temperature: 25°C.

[0091] The resulting board was evaluated in a similar manner to Example 1. In this case, the resulting sample improved by a factor of 25 in resistance to solar radiation. The resulting surface is also superhydrophilic in sunlight, so it can be...

Embodiment 3

[0095] Example 3: TiO with amorphous structure and different thicknesses using reactive sputtering PVD technique 2 A transparent film coats a quartz agglomerate plate with dimensions 300 x 150 x 2 cm.

[0096] Deposition was carried out under the following conditions:

[0097] - Target used: metallic Ti.

[0098] - Applying a potential difference of 531V and 6.57kW / cm 2 The power of 0.58kHz is used to accelerate the bombardment of the target by Ar ions to vaporize it.

[0099] - Working pressure: 7×10 -3 support.

[0100] - Oxidizing gas (O 2 ) flow rate: 1.3mL / min.

[0101] - Deposition rate: 1.0 μm / h.

[0102] - Deposition temperature: 70°C.

[0103] The resulting panels were evaluated for resistance to solar radiation in a manner similar to Example 1, in this case by the color parameter b * change (yellow) ( figure 2 ), it can be seen that the degradation of the surface of the quartz agglomerate target, when db * With an increase of 2 units, it was possible to...

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Abstract

Article in the form of a slab or flagstone fabricated from stone agglomerate coated with thin, transparent films of TiO2 or ZnO, using dry deposition techniques, with a high level of resistance to solar degradation, said article having the form of a slab or flagstone fabricated from stone agglomerate coated with a thin, transparent film of TiO2 and / or ZnO with low or zero photocatalytic activity, said film being deposited by means of dry deposition, physical vapour deposition (PVD) or plasma enhanced chemical vapour deposition (PECVD) techniques. Said article has a high level of resistance to solar degradation, which means that the resulting material is suitable for external environments.

Description

technical field [0001] The present invention relates to TiO 2 and / or plate products made of artificial synthetic stone covered with a ZnO transparent film with low or no photocatalytic activity, which is deposited by dry deposition techniques such as physical vapor deposition (PVD) or Plasma Enhanced Chemical Vapor Deposition (PECVD). The product is highly resistant to solar degradation, which makes the obtained material suitable for outdoor environments. Background technique [0002] Products using unsaturated phthalic polyester resins generally do not have suitable resistance to solar radiation. This is made evident by the yellowing of the parts directly exposed to sunlight due to the breakdown of free radicals in the resin activated by UV radiation. Therefore, there is a need to improve this property for these materials used in outdoor environments exposed to solar radiation. [0003] The solution to this problem is to use as an adhesive another resin with high resist...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/50C04B41/51C23C16/40
CPCC04B41/65C23C14/086C04B41/5049C23C16/405C04B41/009C23C16/407C04B41/5041C23C14/083Y10T428/265Y10T428/31786C04B41/4529C04B41/455C04B41/0054C04B41/4531C04B14/06C04B26/02C04B26/18C04B14/285C04B41/5105
Inventor 何塞·路易斯·雷蒙·莫里诺萨尔瓦多·克里斯托巴尔·罗得里格斯·加西亚劳尔·博萨斯·布拉沃弗朗西斯科·格雷西亚·托雷斯阿德里安·麦地那·希门尼斯弗朗西斯科·尤博罗·瓦伦西亚阿古斯丁·罗得里格斯·冈萨雷斯-伊里沛豪尔赫·吉尔·罗斯特拉巴勃罗·罗梅罗·戈麦斯帕特里夏·德尔·阿尔科·冈萨雷斯
Owner COSENTINO SA
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