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Ultraviolet light curing equipment and method for alarming the ultraviolet light curing equipment

A technology of ultraviolet light and equipment, which is applied in microlithography exposure equipment, alarms, exposure devices for photolithography, etc., can solve the problem of high scrap rate of substrates, achieve high alarm accuracy, avoid production losses, and eliminate faults in a timely manner. Effect

Active Publication Date: 2016-09-14
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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Problems solved by technology

[0004] In the existing photolithography process, the photoresist or photoresist pattern is usually baked one or more times (soft baking or hard baking) to remove the moisture of the photoresist or photoresist pattern. UV light curing equipment is usually used for baking, but the substrate scrap rate after baking with existing UV light curing equipment is high

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  • Ultraviolet light curing equipment and method for alarming the ultraviolet light curing equipment
  • Ultraviolet light curing equipment and method for alarming the ultraviolet light curing equipment
  • Ultraviolet light curing equipment and method for alarming the ultraviolet light curing equipment

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Embodiment Construction

[0018] The inventors of the present invention have found in actual work that the scrap rate of substrates baked by existing ultraviolet light curing equipment is high. The inventors further analyzed the scrapped substrates and found that all scrapped substrates have water stains. The substrate was contaminated during the photocuring process due to water leakage.

[0019] For this reason, the inventors of the present invention have further researched and found that the reason for the water leakage of the UV curing equipment and the formation of water stains on the substrate is that during the UV curing process, the substrate is placed on the surface of the UV curing equipment. substrate carrier (wafer chuck), and when UV curing is performed, the water cooling system of the substrate carrier cools the substrate through water cooling. When the cooling system leaks, the cooling water will spread to the The substrate is placed on the tray, causing the substrate to be polluted by wa...

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Abstract

An ultraviolet light curing device and an alarm method for the ultraviolet light curing device, wherein the ultraviolet light curing device includes: a chamber; an ultraviolet generating device located in the chamber; a substrate carrier plate opposite to the ultraviolet generating device; A water cooling device at the bottom of the tray; a humidity sensor used to detect the humidity in the chamber, and when the humidity in the chamber is greater than a set value, the humidity sensor will alarm. The ultraviolet light curing equipment and the alarm method of the ultraviolet light curing equipment provided by the present invention can avoid production loss during the batch light curing process, and further have the advantages of high alarm accuracy, large alarm range, and timely troubleshooting.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing equipment, in particular to ultraviolet light curing equipment and an alarm method for ultraviolet light curing equipment. Background technique [0002] Photolithography is one of the most important process steps in semiconductor manufacturing. The main function is to copy the pattern on the mask plate to the silicon wafer to prepare for the next semiconductor process, such as etching or ion implantation; the cost of photolithography is about 1 / 3 of the entire silicon wafer manufacturing process, which consumes The time accounts for about 40-60% of the entire wafer process. [0003] A photolithography process is disclosed in the Chinese patent with the publication number CN 101592866A, which specifically includes: providing a substrate to be photoetched; cleaning and drying the substrate; spin-coating the dried substrate for photolithography glue to form a photoresist layer; soft-bakin...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G08B21/20
Inventor 王旭东施海铭巴文林徐立
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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