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A rework process for texturing monocrystalline silicon wafers with white spots

A technology of white spot single crystal and single crystal silicon wafer, applied in sustainable manufacturing/processing, crystal growth, final product manufacturing, etc., can solve the problem of low success rate of rework and achieve the effect of improving the yield rate

Inactive Publication Date: 2011-12-07
江苏伯乐达光伏有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a rework process for monocrystalline silicon wafers with white spots, so as to solve the problem of low success rate of single crystal silicon wafers with single texturing

Method used

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  • A rework process for texturing monocrystalline silicon wafers with white spots
  • A rework process for texturing monocrystalline silicon wafers with white spots

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Embodiment Construction

[0020] The reworking process of texturizing monocrystalline silicon wafers with white spots proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific examples. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.

[0021] The core idea of ​​the present invention is that the rework process of the monocrystalline silicon wafer with white spot is provided. By performing high temperature treatment on the single crystal silicon wafer with white spot, the remaining impurities on the surface are volatilized, and the single crystal silicon wafer with white spot is removed. It is conducive to corrosion in the advanced texturing proces...

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Abstract

The present invention proposes a rework process for producing white spot monocrystalline silicon wafers. The process steps include: performing high temperature treatment on the white spot single crystal silicon wafers to volatilize the remaining impurities on the surface of the white spot single crystal silicon wafers; The monocrystalline silicon wafer with white spot is subjected to a texturing process to remove the white spot on the surface of the single crystal silicon wafer. The rework process of the white spot monocrystalline silicon wafer provided by the present invention is to carry out high temperature treatment on the white spot single crystal silicon wafer to volatilize the remaining impurities on the surface, and the white spot single crystal silicon wafer from which impurities are removed will be used in the subsequent texturing process It is conducive to corrosion, can effectively remove white spots on the surface of single crystal silicon wafers, and greatly improves the yield rate of reworked silicon wafers.

Description

technical field [0001] The invention relates to the field of manufacturing monocrystalline silicon solar cells, in particular to a rework process for making texturized white spot monocrystalline silicon wafers. Background technique [0002] With the increasing tension of global energy sources, solar energy has been widely valued by countries all over the world due to its unique advantages such as no pollution and large market space. Among various solar cell applications, crystalline silicon solar cells have maintained a high market share, firmly dominating the entire solar cell market. How to improve the photoelectric conversion efficiency of solar cells is the key to making solar cells. Among them, the texturing process of solar cells is to use chemical corrosion to texture the surface of silicon chips, and its purpose is to prolong the light in solar cells. The transmission path reduces the reflectivity of the surface, forms light traps inside the cell, and improves the l...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18C30B33/10
CPCY02P70/50
Inventor 林涛李勇陈清波冯帅臣张耀明张茂胜
Owner 江苏伯乐达光伏有限公司
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