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Graphite-Contained Abrasive Abrasive Polishing Pads

A technology of consolidating abrasives and polishing pads, which is applied in the direction of abrasives, wheels of working parts with flexibility, metal processing equipment, etc., which can solve problems such as uneven processing, affect surface quality, and reduce processing efficiency, and achieve structural Simplicity, improvement of surface quality, and improvement of processing efficiency

Inactive Publication Date: 2011-12-14
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the existing grinding and polishing pad wears fast, the processing process is not stable, needs to be constantly trimmed, affects the surface quality of the processing, reduces the processing efficiency, and adds chemical additives to the polishing liquid, which is easy to cause environmental pollution. High lubricity and smoothness Self-dressing resin graphite-containing bonded abrasive grinding and polishing pad

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Example 1: A graphite-containing bonded abrasive grinding and polishing pad, which consists of 350g of diamond abrasives with a particle size of 40 microns, 80g of ordinary graphite powder with a particle size of 20 microns and 570g of resin (the exact same resin used in existing polishing pads can be used , such as hydrophilic resin, can also be realized by using the resin formulations used in the applicant’s previous application numbers of 2007100248219, 2008102440960, 2008100227414, 2009102135958, 201010145260X, the same below) and form after uniform mixing and curing. Some polishing pads are the same. The key point of the present invention is that ordinary graphite powder is added to the polishing pad, and the remaining components are basically the same as the prior art except for the proportioning relationship. The surface roughness of K9 glass processed by the abrasive polishing pad is increased by 100%, the material removal rate is increased by 300%, and the sel...

Embodiment 2

[0019] Example 2: A graphite-containing solid abrasive grinding and polishing pad is formed by uniformly mixing abrasives, graphite particles and resin, and solidifying. The preparation method is the same as that of the existing polishing pad. The abrasive material is 200g of cerium oxide, the graphite particles are 50g of graphite powder whose surface is modified by a coupling agent, and the resin is 750g. The key point of the present invention is that graphite particles are added to the polishing pad, and the remaining components are basically the same as the prior art except for the proportioning relationship. The cerium oxide has a particle size of 10 microns and the graphite particles have a particle size of 10 microns. The surface roughness of K9 glass made of grinding and polishing pad is increased by 150%, the material removal rate is increased by 200%, and the self-repairing ability is increased by 60 times. Grinding and polishing monocrystalline silicon wafers, th...

Embodiment 3

[0020] Example 3: A graphite-containing consolidated abrasive grinding and polishing pad, which is uniformly mixed with abrasives, graphite particles and resin, and formed after curing. Its preparation method is the same as that of existing polishing pads, wherein the abrasive is 400g of silicon carbide, and the graphite particles are surface-coated. Ceramic-coated graphite powder 30g: resin 570g. The key point of the invention is that graphite powder coated with ceramics is added to the polishing pad, and the rest of the components are basically the same as the prior art except for the ratio relationship. The particle size of the silicon carbide is 50-60 microns, and the particle size of the graphite powder coated with ceramics is 20 microns. The surface roughness of K9 glass made of grinding and polishing pad is increased by 50%, the material removal rate is increased by 300%, and the self-repairing ability is increased by 40 times. Grinding and polishing monocrystalline ...

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PUM

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Abstract

A graphite-containing consolidated abrasive grinding and polishing pad is characterized in that it is mainly formed by uniformly mixing and solidifying abrasives, graphite particles and resin, and the mass percentage of the abrasives, graphite particles and resin is abrasive:graphite particles:resin= 5%-50%: 0.5%-10%: 40%-90%. The invention is beneficial to improve the wear resistance and lubricity of the grinding and polishing pad, and improve the stability of processing; cooperate with the grinding and polishing liquid to improve the self-repairing ability of the grinding and polishing pad, which is beneficial to the continuous processing process for a long time and improves the processing efficiency; It is conducive to improving the lubricity of abrasives, reducing surface roughness, and improving surface quality. There is no need to add chemicals to the polishing liquid, which is conducive to environmental protection.

Description

technical field [0001] The invention relates to a finishing tool, in particular to a grinding and polishing pad used in grinding and polishing, in particular to a graphite-containing solidified abrasive grinding and polishing pad. Background technique [0002] It is predicted that the global chip market will reach US$318 billion in 2012, while the global LED lighting market will reach US$13.7 billion in 2013 and will grow to US$28.8 billion in 2015; the demand for small household appliances and hard disk storage is growing strongly, so , The market for sapphire substrate materials, glass display screens and semiconductor chips is optimistic. The United States, China and other countries have successively launched nuclear fusion power generation projects. Among them, only in the "National Ignition Project" of the United States, the amount of optical components has reached more than 40,000. Optical components are also widely used in weapon precision guidance systems, space tele...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D13/00B24D3/28
Inventor 朱永伟李军叶剑锋左敦稳孙玉利
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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