Submicron diffraction grating with modulatable period and preparation method thereof

Abstract

The invention discloses a submicron diffraction grating with a modulatable period and a preparation method thereof. The grating structure of the diffraction grating is manufactured by metal materials having extensibility and is manufactured on a high-molecular elastomer substrate by utilizing a nanometer imprinting micromachining technology. The high-molecular elastomer is stretched towards a direction that is vertical to or in parallel with a grating line; and modulation on amplification or reduction of a grating period can be carried out; besides, longitudinal and transverse stretching degrees of the elastomer is controlled, so that continuous and random modulation can be carried out on the grating period in 20% of a range of an initial period of the grating period; and thus, any predetermined object period is obtained. According to the submicron diffraction grating with a modulatable period in the invention, the grating has advantages that an equal pitch rating and a varied pitch grating have; besides, a grating with a modulatable period is employed to replace a plurality of gratings with different periods; and in a certain wavelength range, optimal matching with an incident light frequency can be realized based on modulation on the grating period.

Description

technical field [0001] The invention relates to a diffraction grating with a submicron-scale period and a preparation method thereof, belonging to the detection field of visible light, ultraviolet light, soft X-ray, etc., and the field of micro-nano processing technology devices. Background technique [0002] Diffraction gratings are the core dispersive elements in various spectroscopic instruments. Diffraction gratings are classified by the distance change between the grating lines, and there are two types: equal pitch grating and variable pitch grating. The traditional equal-pitch diffraction grating can obtain a structure with high grating line density with a period of less than 100 nanometers, but it must be used together with auxiliary components such as collimating mirrors and condensers. Collimating mirrors and condensers are usually composed of off-axis paraboloids with long focal lengths, It is composed of ellipsoid or toroidal surface. It is very difficult and exp...

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Problems solved by technology

The traditional equal-pitch diffraction grating can obtain a structure with high grating line density with a period of less than 100 nanometers, but it must be used together with auxiliary components such as collimating mirrors and condensers. Collimating mirrors and condensers are usually composed of off-axis paraboloids with long focal lengths, It is composed of ellipsoid or toroidal surface. It is very difficult and expensive to process such high-precision aspheric surface. In addition, deep ultraviolet and soft X-rays will be strongly absorbed by most substances, so the number of such optical devices should be minimized in the spectrometer. Use to increase luminous flux

Variable pitch grating is that the grating lines of the grating are not equal and change according to certain rules. The grating has the advantages of self-focusing, aberration correction, high resolution, etc. It can reduce the number of optical components of the spectroscopic instrument and improve the optical transmission efficiency of the system. To simplify the design and processing of spectroscopic instruments, variable pitch gratings have been successfully applied in the fields of space spectrometers, plasma diagnostics, synchrotron radiation monochromators, etc. At present, due to the limitation of manufacturing process, it is difficult to obtain variable pitch grating with submicron period

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