Photoetching machine workpiece stage magnetic preloading balance positioning system

Abstract

A photoetching machine workpiece stage magnetic preloading balance positioning system belongs to the field of semiconductor photoetching technology; the system mainly comprises a base stage, a balance mass system, a magnetic preloading system, a motion unit, a silicon wafer stage, and a balance mass drift-resistant system; the balance mass system comprises two frames which nest each other, and has freedom degrees in the X and Y directions; the motion unit is disposed at the upper part; the impact force caused by the motion part to the base stage is weakened by momentum conservation principle;the balance mass drift-resistant system is used to compensate the position displacement of the balance mass system caused by external resistance during working; the magnetic preloading system is usedfor real-time compensation of the torsion of the workpiece stage along a Z axis; the invention can effectively reduce internal vibration, compensate the torsion of the workpiece stage along the Z axis, and thus greatly improve the motion positioning precision of the silicon wafer stage.

Description

technical field [0001] The invention belongs to the technical field of semiconductor optical lithography manufacturing, and mainly relates to an ultra-precise silicon chip motion positioning system in a lithography machine, in particular to a high-speed workpiece table positioning system with a balance mass vibration damping device. Background technique [0002] Optical lithography is the mainstream technology in the semiconductor chip manufacturing industry. Compared with other lithography technologies, optical lithography has the advantages of high productivity and high positioning accuracy. As one of the most important processes in the front-end production process of integrated circuit chips, its basic principle is to use photoresist as an intermediate medium to realize the transformation, transfer and processing of graphics, and finally transfer the image information to the silicon chip. It is a process in which the design circuit diagram on the mask plate is reduced and...

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Problems solved by technology

[0013] The above-mentioned structure has a direct effect and a simple principle, but due to passive detection, the control system has a certain delay, and it is difficult to suppress Rz in time, and the torsion direction of the balance mass along the Z-axis changes frequently, requiring frequent changes in the speed and rotation direction of the momentum wheel , poor real-time control

In order to balance the relationship between torque magnitude and response speed, the torque and speed of the motor, the mass and dynamic balance of the rotary body need to be precisely matched, otherwise the high-speed rotation of the rotary body and frequent acceleration and deceleration will bring additional vibration, making the motor's It is also difficult to choose

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