Preparation method and application of texture structure ZnO thin film on glass substrate
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A glass substrate and thin film technology is applied in the field of transparent conductive oxide thin films to achieve the effects of improving photoelectric conversion efficiency and simple process
Inactive Publication Date: 2012-04-18
NANKAI UNIV
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[0006] According to literature research, there is no report on the growth of ZnO-TCO thi
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Embodiment 1
[0021] A method for preparing a ZnO film with a textured structure on a glass substrate, using diethyl zinc and water with a purity of 99.995% as source materials, and borane B 2 h 6 For the doping gas, dilute the doping gas borane B with hydrogen 2 h 6 , doping gas borane B 2 h 6 The volume percent concentration in the gas mixture is 1%, and metal-organic chemical vapor deposition (MOCVD) is used to grow a textured ZnO-TCO film on a glass substrate, which is carried out in two steps:
[0022] 1) First, grow a layer of ZnO film with a large grain size "pyramid-like" structure on a glass substrate, the substrate temperature is 155 ° C, the coating reaction pressure is 130 Pa, and the film thickness is 1550 nm;
[0023] 2) Then grow a layer of ZnO film with small grain size "spherical" structure on the above-mentioned "pyramid-like" structure ZnO film, the substrate temperature is 135°C, and the film thickness is 500nm.
[0024] The structure of the textured ZnO thin film o...
Embodiment 2
[0028] A method for preparing a ZnO film with a textured structure on a glass substrate, using diethyl zinc and water with a purity of 99.995% as source materials, and borane B 2 h 6 For the doping gas, dilute the doping gas borane B with hydrogen 2 h 6 , doping gas borane B 2 h 6 The volume percent concentration in the mixed gas is 1%, and metal-organic chemical vapor deposition (MOCVD) is used to grow a textured ZnO-TCO film on a glass substrate, which is carried out in two steps:
[0029] 1) First, grow a layer of ZnO film with a large grain size "pyramid-like" structure on a glass substrate, the substrate temperature is 155°C, the coating reaction pressure is 130Pa, and the film thickness is 2000nm;
[0030] 2) Then grow a layer of ZnO film with small grain size "spherical" structure on the above-mentioned "pyramid-like" structure ZnO film, the substrate temperature is 135°C, and the film thickness is 350nm.
[0031]The structure of the textured ZnO thin film on the g...
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Abstract
The invention discloses a preparation method of a texture structure ZnO thin film on a glass substrate. In the preparation method, by taking diethyl zinc and water as raw materials and taking borane (B2H6) as a doping gas, a texture structure Zno-TCO thin film is grown on the glass substrate by adopting a metal organic chemical vapor deposition method and using two specific steps of: firstly, growing a layer of a pyramid-like-shaped structure ZnO thin film with a large crystal grain size on the glass substrate; and secondly, growing a layer of round-ball-shaped ZnO thin film with a small crystal grain size on the ZnO thin film. The texture structure ZnO thin film on the glass substrate is used for a pin-type microcrystallite silicon thin film solar cell or an amorphous silicon/microcrystallite silicon laminated thin film solar cell. The preparation method has the advantages of simple process and convenience in large-area production and popularization; and by adopting a two-step method growing technology compatible with a process technique, light scattering of visible light and near-infrared region and the subsequent deposition of a silicon-based thin film are facilitated to realize and the photoelectric conversion efficiency of the solar cell can be effectively improved.
Description
【Technical field】 [0001] The invention belongs to the field of transparent conductive oxide films, in particular to a method for preparing a ZnO film with a textured structure on a glass substrate and an application method thereof. 【Background technique】 [0002] Transparent conductive oxides (Transparent conductive oxides-TCO) thin film refers to the average transmittance of visible light (λ = 380 ~ 800nm) high (T ≥ 80%), low resistivity (ρ ≤ 10 -3 Ωcm) oxide film. The widely studied and applied TCO films are mainly F-doped SnO 2 : F thin film, Sn-doped In 2 o 3 :Sn(ITO) thin film and Al-doped ZnO:Al thin film. In the field of solar cell applications, due to ITO and SnO 2 The thin film is easily reduced and blackened in the hydrogen plasma environment, which leads to the deterioration of its optical properties, which becomes an obstacle in the application. In recent years, ZnO thin film has low cost, non-toxicity, easy photolithographic processing and good chemical st...
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