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Extended electrode for photovoltaic tellurium-cadmium-mercury probe and preparation method for extended electrode

A technology for extending electrodes and mercury cadmium telluride, which is applied to circuits, electrical components, semiconductor devices, etc., can solve the problems of small forbidden band width of long-wave detectors, reduced device performance, and easy formation of leakage currents, so as to ensure electrical connectivity, Improve the effect of edge shape

Active Publication Date: 2012-04-18
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

If the indium column is directly grown on the photosensitive element of the chip, the stress point of the flip soldering pressure will directly act on the pn junction of the photosensitive element, and various material defects are likely to be caused at the stressed position. The long-wave detector has a small band gap and is easier to form Leakage current, which makes the dark current of the device too large and reduces the performance of the device

Method used

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  • Extended electrode for photovoltaic tellurium-cadmium-mercury probe and preparation method for extended electrode
  • Extended electrode for photovoltaic tellurium-cadmium-mercury probe and preparation method for extended electrode
  • Extended electrode for photovoltaic tellurium-cadmium-mercury probe and preparation method for extended electrode

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Embodiment Construction

[0022] Below in conjunction with the accompanying drawings, the embodiment of the present invention will be described in detail by taking a chip with a center-to-center distance of 28 microns and an indium column array of 256x1 as an example:

[0023] The embodiment of the present invention adopts the mercury cadmium telluride infrared chip on which the ZnS protective layer has been grown to grow the extended electrode. The preparation method of the extended electrode described in the present invention refers to using a negative photoresist to expose photolithography on the mercury cadmium telluride infrared chip that needs to be prepared to obtain a photoresist mesa with a large top and a small bottom. The pattern shadow effect of the photoresist mesa, grow a compound passivation layer with gradually changing thickness around the pn junction implantation area on the surface of the mercury cadmium telluride chip, grow a layer of electrodes on the pn junction implantation area a...

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Abstract

The invention discloses an extended electrode for a photovoltaic tellurium-cadmium-mercury probe and a preparation method for the extended electrode. The electrode is an extended electrode, and the electrode of a pn junction injection area is extended to the surface of a composite passivation layer of a non-injection area. The method comprises the following steps of: performing photoetching by adopting a negative photoresist to obtain a photoresist mesa with big top and small bottom, growing the composite passivation layer with slowly variable thickness around the pn junction injection area of a tellurium-cadmium-mercury chip by using the pattern shadow effect of the photoresist mesa when a film is grown, growing a layer of electrode, and extending the electrode to a position far away from the pn junction injection area. The electrode prepared by using the method can ensure that the electrode in the pn junction injection area is completely electrically communicated with the electrode on the surface of the composite passivation layer; and meanwhile, an indium post for face-down bonding interconnection is prepared at the extended position of the electrode and far away from the pn junction injection area, so that a pressure bearing point is far away from the pn junction during face-down bonding interconnection and the performance of a device is improved.

Description

technical field [0001] The invention relates to an electrode film preparation technology for a photovoltaic type mercury cadmium telluride detector, in particular to an extended electrode and a preparation method for a photovoltaic type mercury cadmium telluride detector. Background technique [0002] Infrared focal plane detector is an imaging sensor that realizes infrared information acquisition and information processing at the same time, and it has a wide range of applications in military and civilian fields. Mercury cadmium telluride infrared focal plane detector is currently the most rapidly developing and most demanded detector in the world. It has developed from the first generation to the third generation focal plane characterized by large array, miniaturization, multicolor and integration. . [0003] Since the long-wave 8-14 micron is the window for surface radiation detection, it is in the CO2 spectral absorption region, and it is the main area for thermal imagin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0224
CPCY02P70/50
Inventor 廖清君胡晓宁马伟平邢雯陈昱林春王建新
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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