Array substrate, liquid crystal display and manufacturing method of array substrate

Abstract

The invention discloses an array substrate, liquid crystal display and manufacturing method of array substrate; the array substrate comprises a substrate; the substrate comprises a pixel area and a driving circuit area; a common electrode driver interface pattern, a grid line driver interface pattern connected with the common electrode driver interface pattern and a data line driver interface pattern are formed on the substrate positioned in the driving circuit area; a slit is formed on the common electrode driver interface pattern; and various parts of the common electrode driver interface pattern separated by the slit are mutually connected. The technical scheme of the invention consumes the developer solution while the slit is formed on the common electrode driver interface pattern, reduces the influence of the periphery driving circuit area to the concentration of the developer solution in the adjacent pixel area, and improves the manufacturing yield of the array substrate.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to an array substrate, a liquid crystal display and a manufacturing method of the array substrate. Background technique [0002] Liquid crystal display is a commonly used flat-panel display at present, among which thin film transistor liquid crystal display (ThinFilm Transistor Liquid Crystal Display; referred to as: TFT-LCD) has become the mainstream product in liquid crystal display due to its advantages of small size, low power consumption, and no radiation. . Usually TFT-LCD includes liquid crystal panel, drive circuit and backlight source. The liquid crystal panel is the main part of the TFT-LCD. It is composed of an array substrate and a color film substrate, and a liquid crystal layer is filled in between. By controlling the voltage provided by the drive circuit, the liquid crystal molecules are deflected in an orderly manner, resulting in light and dark changes of light....

AI Technical Summary

Problems solved by technology

[0007] However, in the prior art, when the gray-scale mask is used to prepare the first layer of transparent common electrodes, grid lines, and gate electrodes, the concentration of the developer in the adjacent pixel area will be different due to the formation of the driving circuit pattern on the peripheral driving circuit area. Uniform, resulting in the thickness of the photoresist exposed in the gray scale of the pixel area adjacent to the driving circuit pattern is significantly smaller than that of other pixel areas, which usually shows that there is a cloud-like Mura on the edge of the pixel area adjacent to the driving circuit pattern (such as Figure 2A shown)

This cloud-like Mura will affect the subsequent etching process, resulting in increased difficulty of the etching process and difficulty in controlling the parameters of the etching process, which in turn will cause the appearance of etching Mura, thereby reducing product yield.

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