Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist

A technology of photosensitive adhesive and polyepoxy acrylate, which is applied in photomechanical equipment, photoengraving process of pattern surface, and photosensitive materials for optical mechanical equipment, etc. Insufficient capacity, insufficient UV light source power, etc., to improve the printing endurance and alkali resistance.

Inactive Publication Date: 2012-06-06
上海琪川感光设备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, in CTcP technology, the power of the UV light source is not large enough, and it is carried out under the condition of weak exposure-strong display in the exposure-development process.
Due to the lack of anti-alkali and anti-solvent ability of the existing CTcP photosensitive liquid, the photosensitive film layer that constitutes the pattern and dots is damaged

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Add 113 grams (0.913 M) and 550 ml of dioxane (CH 2 ) 4 o 2及 The polyepoxy acrylate resin and m-cresol aldehyde resin that the mixed solution of ethylene glycol ether dissolves, wherein said polyepoxy acrylate resin accounts for polyepoxy acrylate resin and 15% of m-cresol aldehyde resin gross weight, in another Add 138 grams (0.514M) 2-diazo-1-naphthoquinone-5-sulfonyl chloride in a 1000ml flask, use 550ml (CH 2 ) 4 o 2 Dissolve, add 11 grams of activated carbon. Stir for 10 minutes, filter, pour the filtrate into the above-mentioned three-neck flask, stir and mix in a water bath, heat to 30°C, and start to add 10% NaHCO dropwise. 3 Solution, the reaction temperature is controlled by the rate of addition, and the reaction temperature is kept below 40°C for about 2 hours. After cooling, gradually pour it into 5 liters of cold water ≤ 20°C for water analysis. Filter, and dissolve the filter cake in acetone, adding the amount of acetone until the precipitate is com...

Embodiment 2

[0027] Add 113 grams (0.913 M) and 550 ml of dioxane (CH 2 ) 4 o 2及 Polyepoxy acrylate resin and m-cresol aldehyde resin dissolved in the mixed solution of ethylene glycol ether, wherein said polyepoxy acrylate resin accounts for 18% of polyepoxy acrylate resin and m-cresol aldehyde resin gross weight, in another Add 138 grams (0.514M) 2-diazo-1-naphthoquinone-5-sulfonyl chloride in a 1000ml flask, use 550ml (CH 2 ) 4 o 2 Dissolve, add 11 grams of activated carbon. Stir for 10 minutes, filter, pour the filtrate into the above-mentioned three-necked flask, stir and mix in a water bath, heat to 32°C, and start to add 10% NaHCO dropwise 3 Solution, the reaction temperature is controlled by the rate of addition, and the reaction temperature is kept below 40°C for about 2 hours. After cooling, gradually pour it into 5 liters of cold water ≤ 20°C for water analysis. Filter, and dissolve the filter cake in acetone, adding the amount of acetone until the precipitate is complete...

Embodiment 3

[0029] Add 113 grams (0.913 M) and 550 ml of dioxane (CH 2 ) 4 o 2及 Polyepoxy acrylate resin and m-cresol aldehyde resin dissolved in the mixed solution of ethylene glycol ether, wherein said polyepoxy acrylate resin accounts for 20% of polyepoxy acrylate resin and m-cresol aldehyde resin gross weight, in another Add 138 grams (0.514M) 2-diazo-1-naphthoquinone-5-sulfonyl chloride in a 1000ml flask, use 550ml (CH 2 ) 4 o 2 Dissolve, add 11 grams of activated carbon. Stir for 10 minutes, filter, pour the filtrate into the above-mentioned three-necked flask, stir and mix in a water bath, heat to 32°C, and start to add 10% NaHCO dropwise 3 Solution, the reaction temperature is controlled by the rate of addition, and the reaction temperature is kept below 40°C for about 2 hours. After cooling, gradually pour it into 5 liters of cold water ≤ 20°C for water analysis. Filter, and dissolve the filter cake in acetone, adding the amount of acetone until the precipitate is complete...

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PUM

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Abstract

The invention discloses a computer to conventional plate (CTcP) photosensitive resist and a preparation method thereof. The preparation method of the CTcP photosensitive resist comprises that m-cresol-formaldehyde resin, poly(epoxy acrylate) resin and 2-diazo-1-naphthoquinone-5-sulfonyl chloride undergo an esterification reaction to produce an esterified material; and the esterified material is prepared into the CTcP photosensitive resist. The invention also discloses a CTcP prepared from the CTcP photosensitive resist. Through the CTcP photosensitive resist obtained by the preparation method, the CTcP pressrun is improved and is more than 150000.

Description

technical field [0001] The invention relates to a CTcP photosensitive glue, a preparation method thereof and a CTcP plate. Background technique [0002] The digitalization of printing plate making is the general trend of the printing plate making industry at present, thus giving birth to a large number of new technologies of computer-to-plate making. CTcP is one of them. CTcP (Computer to Conventional Plate) refers to the computer-to-plate technology on the traditional PS plate, which can also be called UV-CTP system technology. Its working principle is as follows: In the CTcP process, UV is irradiated on the digital micromirror component DMD, and there are about 1 million micromirrors on the DMD. Each micromirror is controlled by digital means, and the UV light irradiated on its surface has two One result: UV passes through the micromirror and is accepted by the optical lens system; or the micromirror deflects UV light so that the lens cannot receive UV light. This way o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/021G03F7/09
Inventor 毛孜宏黄文秀
Owner 上海琪川感光设备有限公司
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