Method for producing crease-resisting fabric
A manufacturing method and technology for anti-wrinkle fabrics, which are applied in the field of textile processing and can solve problems such as toxicity and human injury.
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[0008] Example 1
[0009] The samples were prepared on JGP560B ultra-high vacuum magnetron sputtering equipment by radio frequency reactive magnetron sputtering. The target is made of water-based polyurethane finishing agent, with a diameter of 60mm and a thickness of 4mm. A plain weave fabric made of 30 ordinary cotton yarns is used as the substrate. During the sample preparation process, the vacuum chamber atmosphere is argon with a purity better than 99.99%, and the distance between the substrate and the sputtering target is 50 mm. The background vacuum is 2.5×10-4Pa, and the working pressure during the construction process is controlled to 0.75Pa. The substrate temperature is controlled at room temperature, the RF sputtering power is controlled to 85W, and the sample deposition time is 1h.
[0010] The operation process is:
[0011] Pre-treatment of the substrate-Place the slide on the substrate rack-Check the equipment to ensure that the sputtering chamber is clean-Vacuum pum...
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[0012] Example 2
[0013] The samples were prepared on JGP560B ultra-high vacuum magnetron sputtering equipment by radio frequency reactive magnetron sputtering. The target is made of water-based polyurethane finishing agent, with a diameter of 60mm and a thickness of 3mm. Using 80 polyester twill fabric as the substrate, the vacuum chamber atmosphere during the sample preparation process is argon with a purity better than 99.99%, and the distance between the substrate and the sputtering target is 50 mm. The background vacuum is 3.5×10-4Pa, and the working pressure during construction is controlled to 0.75Pa. The substrate temperature was controlled at room temperature, the RF sputtering power was controlled to 95W, and the sample deposition time was 1h.
[0014] The operation process is:
[0015] Pre-treatment of the substrate-Place the slide on the substrate rack-Check the equipment to ensure that the sputtering chamber is clean-Vacuum pump 2.5×10-4Pa-Pass in working gas-Pre-spu...
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