Method for producing crease-resisting fabric
A manufacturing method and technology for anti-wrinkle fabrics, which are applied in the field of textile processing and can solve problems such as toxicity and human injury.
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Embodiment 1
[0009] The samples were prepared on JGP560B ultra-high vacuum magnetron sputtering equipment by radio frequency reactive magnetron sputtering method. The target material is made of water-based polyurethane finishing agent, with a diameter of 60mm and a thickness of 4mm. The plain weave fabric made of 30 ordinary cotton yarns was used as the substrate. During the sample preparation process, the vacuum chamber atmosphere was argon with a purity better than 99.99%, and the distance between the substrate and the sputtering target was 50mm. The background vacuum is 2.5×10-4Pa, and the working air pressure during the control construction process is 0.75Pa. The substrate temperature was controlled at room temperature, the RF sputtering power was controlled at 85W, and the sample deposition time was 1h.
[0010] The operation process is:
[0011] Pretreatment of the substrate——put the slide on the substrate holder—check the equipment to ensure the sputtering chamber is clean——vacuum...
Embodiment 2
[0013] The samples were prepared on JGP560B ultra-high vacuum magnetron sputtering equipment by radio frequency reactive magnetron sputtering method. The target material is made of water-based polyurethane finishing agent, with a diameter of 60mm and a thickness of 3mm. 80 polyester twill fabrics were used as the substrate, the vacuum chamber atmosphere was argon with a purity better than 99.99% during the sample preparation process, and the distance between the substrate and the sputtering target was 50mm. The background vacuum is 3.5×10-4Pa, and the working air pressure during the control construction process is 0.75Pa. The substrate temperature was controlled at room temperature, the RF sputtering power was controlled at 95W, and the sample deposition time was 1h.
[0014] The operation process is:
[0015] Pretreatment of the substrate——put the slide on the substrate holder—check the equipment to ensure the sputtering chamber is clean——vacuumize the pump at 2.5×10-4Pa——i...
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