Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nano-linking method based on photo-curing with nonlinear frequency shift effect

A nonlinear, photocurable technology, applied in the field of photocurable nanolinks that break through the diffraction limit of traditional optics

Active Publication Date: 2012-07-11
SOUTHEAST UNIV
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, limited by the optical diffraction limit, the limit precision of UV curing is generally on the order of microns. Even with deep ultraviolet lithography technology, the limit precision of photolithographic patterns is still on the order of hundreds of nanometers, which cannot be used for precise preparation of finer Structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nano-linking method based on photo-curing with nonlinear frequency shift effect
  • Nano-linking method based on photo-curing with nonlinear frequency shift effect
  • Nano-linking method based on photo-curing with nonlinear frequency shift effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Prepare a self-assembled nanoparticle microstructure on the surface of a solid substrate, and apply the nanolink method proposed by the present invention to link nanoparticles. The specific preparation process steps are as follows Figure three Shown:

[0034] Step 1: prepare an organic polymer film 7 on the surface of the solid substrate 6 .

[0035] Step 2: Deposit nanoparticles 1 with surface plasmon resonance properties on the surface of organic polymer 7 through chemical self-assembly technology. The distance between nanoparticles 1 can be controlled by self-assembly technology. In order to achieve effective links, the distance is generally between zero and between tens of nanometers.

[0036] Step 3: drop-coat or spin-coat the UV-sensitive polymer 2 on the surface of the substrate, and irradiate the sample with a low-frequency visible light or near-infrared light source. The incident light forms a significant local light scattering enhancement between the nanopa...

Embodiment 2

[0041] The nano-linkage method proposed by the present invention is used to directly realize the linking of nanoparticles in the ultraviolet photosensitive polymer 2 solution. Specific steps include:

[0042] Step 1: Using an optical method, a high concentration of nanoparticles 1 with surface plasmon resonance properties is doped into a solution of an ultraviolet photosensitive polymer 2 .

[0043] Step 2: Add chemical substances to the UV-sensitive polymer 2 solution, wrap them on the surface of the nanoparticles 1, form a stable chemical coordination bond, and make the nanoparticles 1 form a dynamic self-assembly in the solution, and the distance between the nanoparticles is between zero and between tens of nanometers.

[0044] Step 3: irradiating the UV photosensitive polymer 2 solution with a low-frequency visible light or a light source in the near-infrared band. The incident light forms a significant local light scattering enhancement between the dynamically self-asse...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A nano-linking method based on photo-curing with nonlinear frequency shift effect is disclosed, which specifically comprises the following steps of: step 1, placing nano-particles close to each other and with surface plasma resonance characteristic in an ultraviolet photosensitive polymer; step 2, irradiating the ultraviolet photosensitive polymer by a low-frequency visible light, and releasing ahigh-frequency light because the incident low-frequency visible light generates great light scattering reinforcement among the nano-particles close to each other and with surface plasma resonance characteristic, and generates remarkable nonlinear frequency shift effect; and step 3, absorbing a multi-frequency light and curing by the ultraviolet photosensitive polymer in an area among the nano-particles with surface plasma resonance characteristic to form a photo-cured polymer, and permanently connecting a plurality of nano-particles with surface plasma resonance characteristic together to obtain nano-microstructures with different shapes. The nano-linking method disclosed by the invention has an ultrahigh resolution which breaks through diffraction limit, and can realize selective linkagefor nano-materials according to design proposal.

Description

technical field [0001] The invention belongs to the field of nano-manufacturing technology, and in particular relates to a photo-cured nano link method based on nonlinear frequency shift effect, more precisely, a photo-cured nano link method that breaks through the traditional optical diffraction limit. Background technique [0002] Permanently linking nanomaterials together to make complex nanodevices is an important research problem in the field of nanofabrication technology. Since the 1980s, the research on nanomaterials has gradually heated up, and the controllable growth of nanomaterials is no longer a technical challenge. Researchers have done a lot of research work, conducted a lot of experimental research on the optical, mechanical, electrical and thermal properties of nanomaterials, and predicted that nanomaterials are expected to be applied in many fields and greatly improve people's lives. However, from the preparation of nanomaterials to the development of nanod...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00
Inventor 张彤张晓阳李若舟王龙德
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com