Double-flexible-grinding-head magnetorheological polishing device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS
- Publication Date
- 2012-08-15
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Abstract
Description
technical field
[0001] The invention belongs to the field of optical manufacturing, and in particular relates to a dual-flexible grinding head magnetorheological polishing device, in particular to a dual-flexible grinding head magnetorheological polishing device for magnetorheological polishing of large-diameter, high-precision phase-like optical elements. Polishing device. Background technique
[0002] Large-aperture continuous phase plate (CPP) is a new type of phase-like optical element with deep relief topological structure of continuous wave surface, which is mainly used for focal spot shaping and light intensity control of large laser devices. Compared with traditional phase elements such as Random Phase Plate (RPP), Kinoform Phase Plate (KPP) and Distribution Phase Plate (DPP), CPP has higher energy utilization High efficiency and more precise focal spot shape control characteristics are considered to be the most effective solution to achieve beam smoothing of large ...