Method for preparing nanocomposite dielectric film
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- UNIV OF ELECTRONICS SCI & TECH OF CHINA
- Publication Date
- 2012-08-15
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the field of electronic materials and components, in particular to a preparation method of a dielectric thin film based on a composite nanostructure. Background technique
[0002] High energy density capacitors are widely used in missiles and space fields, mainly for new electromagnetic pulse weapons (electromagnetic bombs and electromagnetic cannons) and electromagnetic energy weapons (electromagnetic rail guns and electromagnetic armor-piercing weapons), excimer Laser weapons, particle beam accelerators, high-power microwave sources, X-ray sources and other new concept weapons, strategic ballistic missiles, electromagnetic armor, etc. Due to the embargo imposed on my country by the United States of high energy storage density capacitors, the development of new electromagnetic energy weapons in our country is restricted.
[0003] In high energy storage density capacitors, the shape and performance of the dielectric materials ...