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Wave aberration correcting device and method

A correction device and wave aberration technology are applied in the field of wave aberration correction, which can solve complex problems and achieve the effects of long service life, simple structure and simple operation.

Active Publication Date: 2012-09-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem solved by the invention is that the wave aberration correction of the existing projection objective lens is realized by a movable lens, and its structure is complex and the operation is complicated

Method used

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  • Wave aberration correcting device and method

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Embodiment Construction

[0040] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0041] The structure of the wave aberration correction device and its projection objective lens used in the present invention is as follows: figure 1 As shown, the projection objective lens 100 is composed of optical refracting lens groups 102, 104, aperture stop 103, and liquid lens 200. 104 emerges to the image plane 105 .

[0042] The wave aberration correction device includes a liquid lens 200 , a wave aberration measurement system 201 , and a signal processing system 202 .

[0043] The structure of the liquid lens 200 is as figure 2 As shown, the liquid lens is a liquid lens array. The shape of the liquid lens array is circular, the diameter is determined according to the diameter of the aperture stop, and the diameter ranges from 50 mm to 300 mm. The liquid lens array is composed of a transparent bottom plate 21, a transparent cover...

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Abstract

The invention relates to a wave aberration correcting device and method. The correcting device comprises a wave aberration measuring system, a signal processing system and a liquid lens, wherein the wave aberration measuring system is used for measuring wave aberration of a projection objective, the signal processing system is used for processing the wave aberration of the projection objective and outputting a driving voltage signal, and the liquid lens is used for generating deformation according to the driving voltage signal and carrying out wave aberration correction on the projection objective. The correcting method comprises the following steps: the wave aberration measuring system measures the wave aberration on an image plane, calculates deviation of the wave aberration of the projection objective and a required value, fits the deviation into a wavefront error and sends the wavefront error to the signal processing system; the signal processing system converts the received wavefront error into deformation deviation of the liquid lens and outputs a driving direct current voltage according to the deformation deviation of the liquid lens; and the driving direct current voltage causes the liquid lens to deform. The wave aberration correcting device and correcting method disclosed by the invention can realize correction on the wave aberration of the projection objective, and the correcting device disclosed by the invention is simple in structure, low in cost, easy in operation and long in service life.

Description

technical field [0001] The invention relates to the field of wave aberration correction, in particular to a wave aberration correction device and method applied to a projection objective lens of a lithography device. Background technique [0002] The wave aberration of the projection objective lens is an important factor affecting the engraving accuracy of the lithography machine and the lithography resolution. With the continuous reduction of the lithography feature size CD, the impact of the wave aberration on the lithography imaging quality becomes more and more prominent. During the use of the lithography machine, the wave aberration will change due to thermal effects, processing stress release, exposure process changes, and external environment changes. Once the wave aberration changes, it will affect the imaging quality and affect the yield of silicon wafers. Therefore, the correction of the wave aberration of the projection objective lens of the lithography machine ha...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 段立峰李映笙马明英
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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