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Compression method for image data string in direct writing lithography system

A lithography system, technology of image data

Active Publication Date: 2014-08-27
中夏芯基(上海)科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to increase production capacity, it is necessary to speed up the moving speed of the platform and increase the DMD refresh speed of the exposure system, resulting in an increase in the data to be transmitted. The size of the projected pixels directly restricts the performance of the photosensitive image. The amount of data cannot be reduced by increasing the size of the projected pixels. It is also impossible to increase the baud rate of communication indefinitely, even if it increases, it will change the hardware structure, resulting in an increase in cost, and at the same time, the transmission of a large amount of data will also increase the requirements for the transmission medium
[0003] The image data transmitted by the direct writing exposure system to the digital micromirror (DMD) is a binary number without grayscale, that is, 0 or 1. When there are block patterns in the image, the transmitted data may be 1, and the USB bus adopts reverse The non-return-to-zero (NRZI) encoding method will automatically insert a 0 for clock synchronization, resulting in a certain communication bandwidth loss

Method used

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  • Compression method for image data string in direct writing lithography system

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Embodiment

[0028] The compression method of image data string in direct-write lithography system is characterized in that the compressed data is in bytes, and different expression bits are combined into different data structures. In the structure, the bit data from high to low is the instruction Bit, image point data, or indicating bit, indicating bit, or counting value, or indicating bit, indicating bit, or explanatory data;

[0029] Specific steps are as follows:

[0030] (1) Read a line of data, and press the start description of the save line (hexadecimal number) 05H (10), check that this line is the first line of the image, press and save it (hexadecimal number) 05H ( 8), cache this line and fetch this line and go to step (4), otherwise continue to the next step;

[0031] (2) Perform correlation comparison with the cache line, that is, XOR corresponding to the cache line, check the number of 0 to determine the correlation coefficient;

[0032] (3) If the correlation coefficient is 1, that ...

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Abstract

The invention discloses a compression method for image data string in a direct writing lithography system. Compressed data uses bytes as unit and combines into different data structures in different express bytes; and structural bit data is, from high to low, indicating bit and image point data, or indicating bit, expression bit and count value, or indicating bit, expression bit and illustration data. The compression method of the invention is simple and fast; compressed data satisfies reverse non-return-to-zero (NRZI) coding requirements in transmission, without inserting data bits or wasting bandwidth; and compressed data can utilize correlation in the image to increase compression ratio.

Description

Technical field [0001] The present invention relates to the field of lithography in the semiconductor industry and the printed circuit board industry, and in particular to a method for compressing image data strings in a direct-write lithography system, in particular to a direct-write lithography machine exposure system used in a spatial light modulator or Data transmission compression processing method of laser direct writing exposure system (LDI). Background technique [0002] The direct writing exposure system transmits image data to the digital micromirror (DMD) through the USB interface, and the micromirror DMD directly projects the image onto the film-coated PCB on the platform for light exposure. Digital micromirror DMD is a kind of spatial light modulator, which can switch the optical path with high efficiency, and can control up to 2 million optical paths. The exposure system continuously updates the micro-mirror DMD control according to the platform movement speed and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H04N1/41
Inventor 陈勇张爱民陈修涛
Owner 中夏芯基(上海)科技有限公司
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