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Arsenic-removing device and method for gallium arsenide wafer production and processing waste water

A technology for gallium arsenide wafers and waste water processing, applied in chemical instruments and methods, multi-stage water/sewage treatment, neutralized water/sewage treatment, etc., can solve problems such as limited arsenic removal efficiency and unstable flocculation and sedimentation effect , to achieve the effect of high removal rate, easy operation and stable operation

Inactive Publication Date: 2012-11-14
BEIJING MUNICIPAL RES INST OF ENVIRONMENT PROTECTION
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Problems solved by technology

[0005] The purpose of the present invention is to solve the problem of unstable flocculation and sedimentation effect and limited arsenic removal efficiency when the above-mentioned chemical precipitation method is used to treat gallium arsenide wafer production and processing wastewater. Arsenic device and method

Method used

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  • Arsenic-removing device and method for gallium arsenide wafer production and processing waste water
  • Arsenic-removing device and method for gallium arsenide wafer production and processing waste water

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Embodiment

[0023] An arsenic removal device for gallium arsenide wafer production and processing wastewater according to the present invention, the device includes a first-stage arsenic removal tank 2, a first-stage arsenic removal tank mixer 3, a second-level arsenic removal tank 5, a second-level arsenic removal tank mixer 6, Secondary lift pump 7, intermediate tank 8, third-stage lift pump 9, sand filter tank 10, clear water tank 11 and recoil pump 12. Among them, the water outlet of the primary arsenic removal tank 2 is connected with the water inlet of the secondary arsenic removal tank 5 through the primary lifting pump 4; the water outlet of the secondary arsenic removal tank 5 is connected with the water inlet of the intermediate tank 8 through the secondary lifting pump 7; The water outlet of the pool 8 is connected to the water inlet of the sand filter 10 through the three-stage lifting pump 9; the sand filter 10 is connected to the clean water tank 11 through pipelines;

[002...

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Abstract

The invention relates to an arsenic-removing device and method for gallium arsenide wafer production and processing waste water and belongs to the technical field of waste water treatment. The arsenic-removing method comprises conveying raw water to a primary arsenic-removing tank, performing sequencing batch flocculation and sedimentation to remove arsenic, and enabling the basic process to comprise water inflow, flocculation, sedimentation and water outflow; enabling treated supernatant to enter a secondary arsenic-removing tank, first performing oxidation reactions, then performing sequencing batch flocculation and sedimentation to remove arsenic, and enabling the basic process to comprise water inflow, oxidation, flocculation, sedimentation and water outflow; first enabling the treated supernatant to flow into an intermediate tank, conveying the supernatant to a sand filter through a three-level lift pump to perform gravity filtration, enabling final outflow water to enter a clean water pond after filtration, and discharging the effluent finally; utilizing a backflushing pump to perform back flush on the sand filter at a fixed period, and taking backflushing water from the clean water pond. The arsenic-removing device and the arsenic-removing method are high in arsenic-removing rate, enable concentration of arsenic in the outflow water to be controlled to be below 0.02mg / L, are easy to operate, run stably, and are suitable for treating the gallium arsenide wafer production and processing waste water and arsenic-containing waste water of related industries.

Description

technical field [0001] The invention relates to a device and method for removing arsenic from gallium arsenide wafer production and processing wastewater, and belongs to the technical field of wastewater treatment. Background technique [0002] Crystal synthesis, growth, cutting, grinding, polishing, cleaning and other processes involved in the production and processing of gallium arsenide wafers will generate a large amount of arsenic-containing wastewater, the concentration of arsenic can reach up to 100mg / L, mainly in the form of trivalent arsenic , The wastewater is milky white and contains a large number of suspended particles, most of which are distributed between 50 and 200nm in particle size. It has excellent suspension and dispersion, and is not easy to be coagulated and precipitated. [0003] At present, the methods for treating arsenic-containing wastewater mainly include chemical precipitation, physicochemical and biological methods. The chemical precipitation m...

Claims

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Application Information

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IPC IPC(8): C02F9/04C02F1/52C02F1/56C02F1/66
Inventor 李安峰骆坚平潘涛徐文江袁阳洋
Owner BEIJING MUNICIPAL RES INST OF ENVIRONMENT PROTECTION
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