Electrical arc ion plating cooling apparatus for preparing amorphous film, and applications thereof

Abstract

The present invention belongs to the field of film preparation, and specifically relates to an electrical arc ion plating cooling apparatus for preparing an amorphous film, and applications thereof. The cooling apparatus comprises a condensing agent input pipe, a condensing agent output pipe, a flange, an insulation washer and a sample table, wherein the flange is installed on an electrical arc ion plating furnace through the insulation washer in a sealing manner, one end of the condensing agent input pipe and one end of the condensing agent output pipe are respectively installed on the flange, penetrate through the flange, and are respectively connected with a water inlet and a water outlet of a condensing agent circulation system with controllable exterior flow rate, the other end of the condensing agent input pipe and the other end of the condensing agent output pipe are connected with the sample table, and the sample table, the part condensing agent input pipe lower than the flange, and the part condensing agent output pipe lower than the flange are positioned inside a vacuum cavity of the electrical arc ion plating furnace. The cooling apparatus of the present invention can be used for an amorphous film preparation process. In addition, the cooling apparatus of the present invention has the following characteristics that: the advantage of rapid deposition of electrical arc ion plating is provided; a substrate temperature can be effectively controlled; and purposes of film structure change and film performance increase can be achieved.

Description

technical field [0001] The invention belongs to the field of thin film preparation, in particular to an arc ion plating cooling device for preparing amorphous thin film and its application. Background technique [0002] Arc ion plating deposition technology is a coating technology that uses cold cathode self-sustaining arc discharge as evaporation source in vacuum. The vacuum system is fed with argon to 1-10 -1 At Pa, an arc discharge is initiated between the cathode target and the anode vacuum chamber to generate a high-density metal vapor plasma, and the positive metal ions of the target are deposited on the surface of the substrate to form a film under the acceleration of a negative voltage electric field. It can be seen that the nucleation and growth of the film deposited by arc ion plating are stimulated by ion acceleration, and the ionized target metal positive ions and gas positive ions are accelerated by the electric field together, and continuously bombard the surf...

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Problems solved by technology

[0006] In order to solve the problem that the deposition rate of magnetron sputtering technology is low (0.01~0.5μm / min), and it is difficult to apply in industry when depositing thicker amorphous films, the arc ion plating magnetic filtration technology is solved due to the plasma in The loss in the transmission process, the deposition rate drops significantly and the additional magnetic filter equipment must be added, which increases the cost of the coating. The purpose of the present invention is to provide an arc ion plating cooling device for preparing amorphous films and its application

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