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Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof

A manufacturing method and multilayer film technology, applied to chemical instruments and methods, mirrors, layered products, etc., can solve the problems of poor thermal stability of Mg-based multilayer films, etc.

Inactive Publication Date: 2013-01-09
TONGJI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The object of the present invention is exactly to propose a kind of Mg / Zr extreme ultraviolet multilayer film mirror and its manufacture method that adopt metal Zr as absorbing layer in order to overcome the defect of poor thermal stability of existing Mg-based multilayer film

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  • Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof
  • Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof

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Embodiment

[0024] A Mg / Zr extreme ultraviolet multilayer film reflector, its structure is as figure 1 As shown, the reflector includes a substrate 1, on which a primer layer 2, a Mg / Zr periodic multilayer film 5 and a protective layer 6 are stacked in sequence, wherein the Mg / Zr periodic multilayer film is periodically alternated by Mg films and Zr films Plating composition. The material of the base 1 is a single crystal silicon wafer or glass, and the present embodiment adopts a single crystal silicon wafer whose crystal orientation is (100). -3nm. In this embodiment, it is 2nm. The Mg / Zr periodic multilayer film 5 is plated on the base layer 2, the first layer plated is the Mg film 3, the last layer is the Zr film 4, and the number of cycles is 30-40, the number of cycles in the present embodiment is 40, the total thickness of the Mg / Zr periodic multilayer film 5 is 450-640 nm, and the ratio of the Mg layer thickness to the periodic thickness is 0.6-0.8, which is 0.8 in this embodim...

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Abstract

The invention relates to a Mg / Zr extreme ultraviolet multilayer film reflector and a manufacturing method thereof. A bond coat is plated on an ultrasmooth silicon chip or an ultrasmooth glass substrate; Mg and Zr film layers are alternately plated to form a Mg / Zr period multilayer film; and then B4C is plated on the period multilayer film to form a protection film. Compared with the prior art, the metal Zr with a high melting point and a stable phase state is used as an adsorption layer of the multilayer film; and the manufactured Mg / Zr extreme ultraviolet multilayer film reflector overcomes the defect of poor stability of conventional Mg-based multilayer films such as Mg / SiC and the like. Meanwhile, the Zr has a suitable optical constant in the extreme ultraviolet waveband; and the Mg / Zr extreme ultraviolet multilayer film reflector keeps the excellent optical performance of a Mg-based multilayer film reflector. Therefore, the Mg / Zr multilayer film reflector which gives consideration to the optical performance and the thermal stability is suitable to apply in the extreme ultraviolet waveband with a high working environment temperature, in which the operations of synchronously radiating a light source, observing a space and the like are carried out.

Description

technical field [0001] The invention belongs to the field of manufacturing precision optical elements, and in particular relates to a Mg / Zr extreme ultraviolet multilayer film reflector and a manufacturing method thereof. Background technique [0002] Extreme ultraviolet astronomical observation is an important means to study solar activities, solar-terrestrial environment, and long-term weather forecast. The extreme ultraviolet astronomical telescope can image important solar spectral lines such as Fe XV (28.4nm) and He II (30.4nm), and can real-time Monitor the dynamics of the sun and its impact on Earth. On the other hand, there are many characteristic spectral lines of elements in the extreme ultraviolet band, and the identification of characteristic spectral lines of elements in artificial light sources such as synchrotron radiation is an important means of chemical analysis. In the extreme ultraviolet band, all kinds of materials have absorption and the refractive ind...

Claims

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Application Information

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IPC IPC(8): G02B5/08G02B1/10B32B9/04B32B15/00C03C17/36G02B1/14
Inventor 朱京涛周斯卡李浩川王占山
Owner TONGJI UNIV
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