Method utilizing metal grating to achieve wideband adjustable silicon waveguide optical non-linear four wave mixing enhancement

An optical nonlinear, metal grating technology, applied in nonlinear optics, optics, instruments, etc., can solve the problem that the third-order nonlinear process is not very deep, and achieve the effect of simple structure and easy realization.

Inactive Publication Date: 2013-02-06
SHANGHAI NORMAL UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] At present, optical nonlinear effect enhancement technology has a good theoretical and experimental basis after continuous development and improvement, and people have begun to study nonlinear photonic devices such as optical switches, logic gates, memories, and optical solitons based on nonlinear effects. conducted preliminary application research; however, there are still many deficiencies in the research on the enhancement of optical nonlinear effects, such as: 1) Scholars at Stanford University have made great progress in the enhancement of optical nonlinear effects, but due to this The manipulation of light is based on ultra-cold media, which is still far away from practical applications. 2) Although researchers from research institutes such as the United States, Germany, Canada, and France have made considerable breakthroughs in the enhancement of nonlinear effects, but They only achieve nonlinearity at a specific wavelength or narrow frequency band, which is still a certain distance from the high-bandwidth applications required in the future; 3) People are interested in second-order nonlinear processes on various surfaces and interfaces, such as quadratic The generation of harmonics and sum frequencies has been extensively studied, while third-order nonlinear processes such as four-wave mixing have not been studied in depth

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  • Method utilizing metal grating to achieve wideband adjustable silicon waveguide optical non-linear four wave mixing enhancement
  • Method utilizing metal grating to achieve wideband adjustable silicon waveguide optical non-linear four wave mixing enhancement
  • Method utilizing metal grating to achieve wideband adjustable silicon waveguide optical non-linear four wave mixing enhancement

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Embodiment 1

[0027] Figure 4 is a plot of the local enhancement factor as a function of grating width.

[0028] from image 3 It can be seen that the maximum value of the light intensity enhancement of the four-wave mixing signal is 48.87 at the wavelength λ 4WM =1712nm. In this embodiment, the wavelengths of the two incident lights are selected as λ A =1487nm and λ B =1592nm, the obtained four-wave mixing signal wavelength is λ 4WM =1712nm. The metal thickness is t=50nm, the grating period is d=1000nm, and the silicon thickness is h=100nm.

[0029] Calculation method and figure 2 and image 3 same. Increased metal width from 0nm to 1000nm, Figure 4 The change trend of local enhancement factor with grating width is saddle-shaped, and there is a local minimum when the metal width is 347nm(a), 408nm(b), 478nm(c) and 346nm(d). Simultaneous calculation results show that the local enhancement factor (EF) of the four-wave mixing process l When the grating width is 224nm, it can re...

Embodiment 2

[0031] Figure 5 is the local enhancement factor (EF) of the four-wave mixing process l A plot of silicon waveguide thickness as a function of thickness.

[0032] In this embodiment, the wavelengths of the two incident lights are selected as λ A =1487nm and λ B =1592nm, the resulting four-wave mixing wavelength is λ 4WM =1712nm. The metal thickness t=50nm, the metal width l=100nm, the grating period is d=1000nm, and the thickness range h of the silicon waveguide is 60nm-120nm.

[0033] calculation method and figure 2 , image 3 and Figure 4 same. Silicon thickness increased from 60nm to 120nm. Figure 5 It can be seen that the local enhancement factor has a greater enhancement when the thickness of the silicon waveguide is in the range of 90nm-110nm, and the enhancement reaches the maximum when the thickness is 100nm.

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Abstract

The invention discloses a method utilizing metal gratings to achieve wideband adjustable silicon waveguide optical non-linear four wave fixing enhancement. A silicon waveguide is arranged on a metal underlay, which is characterized in that metal gratings are periodically arranged on the silicon waveguide. According to the invention, the enhancing wideband and enhancing factors of the silicon waveguide optical non-linear four wave mixing are determined by the silicon waveguide and the geometric parameters and the grating period of the metal gratings. The invention has the advantages of simply structure and easiness in implement; via properly selecting parameters, a wideband adjustable silicon waveguide optical non-linear four wave fixing enhancement effect is obtained, thus the reliability of the development of the non-linear optical elements is guaranteed, e.g. an optical switch, a logical gate, a memory, an adjustable non-linear waveguide and the like, which are recently disclosed in an all optical communication network.

Description

technical field [0001] The invention relates to a broadband tunable silicon waveguide optical nonlinear four-wave mixing enhancement method, in particular to a method of using metal gratings to excite surface plasmons in the bandwidth range to realize dynamically tunable silicon waveguide optical nonlinear four-wave mixing enhancement The method is suitable for optical fiber communication systems and networks. Background technique [0002] In order to meet the needs of the development of today's information and communication technology, photonics and integrated optics, all-optical micro-nano-structured photonic integrated components with new physical effects are the frontier and hot spot of current research in the field of optics. Therefore, the new small-sized and easy-to-integrate surface plasmons have also become the focus of attention and research by scholars at home and abroad. In the surface plasmon structure, the incident photoelectric magnetic field is coupled with ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/365G02F1/35
Inventor 陈志红王丽慧汪春梅
Owner SHANGHAI NORMAL UNIVERSITY
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