Method for electrodepositing gallium at low temperature by using ionic liquid

An ionic liquid, electrodeposition technology, applied in the improvement of process efficiency, photography process, instruments and other directions, can solve the problems of unfriendly environment, polluted environment, corroded equipment, etc., to achieve environmental friendliness, less corrosive equipment, low operating temperature Effect

Inactive Publication Date: 2013-04-10
IRICO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, there are some problems in the production of gallium by industrial electrodeposition, such as high energy consumption, unfriendly to the environment, corrosion of equipment, high cost, and environmental pollution.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] The chlorinated 1-ethyl-3-methylimidazole ([Emim]Cl) ionic liquid was heated to a colorless and transparent state under a constant temperature oil bath at 60 °C, and then gallium chloride (GaCl 3 ) into the chlorinated 1-ethyl-3-methylimidazolium ionic liquid to form a gallium chloride solution; then use two parallel pieces of metal tungsten with a purity of more than 99.9% as the anode and solid metal gallium as the cathode for the chloride The gallium solution is electro-deposited, chlorine gas is generated on the anode, and solid gallium is precipitated on the cathode; the anode in the electrolytic cell is parallel to the surface of the cathode, and the anode and cathode are arranged in an anode-cathode-anode manner; the current density of the cathode is controlled at 80A / m 2 , the cell voltage is 2.8V, the electrode distance between the cathode and the anode is 15mm, the electrodeposition temperature is 50°C, and the electrodeposition time is 0.5h.

Embodiment 2

[0017] The chlorinated 1-butyl-3-methylimidazolium ([Bmim]Cl) ionic liquid was heated to a colorless and transparent state in a constant temperature oil bath at 60°C, and then gallium chloride (GaCl 3 ) is dissolved in 1-butyl-3-methylimidazolium chloride ionic liquid to form a gallium chloride solution; then two parallel metal tungsten with a purity of more than 99.9% are used as anodes, and solid metal gallium is used as a cathode for the chloride The gallium solution is electro-deposited, chlorine gas is generated on the anode, and solid gallium is precipitated on the cathode; the anode in the electrolytic cell is parallel to the surface of the cathode, and the anode and cathode are arranged in an anode-cathode-anode manner; the current density of the cathode is controlled at 80A / m 2 , the cell voltage is 3.0V, the electrode distance between the cathode and the anode is 14mm, the electrodeposition temperature is 50°C, and the electrodeposition time is 0.5h.

Embodiment 3

[0019] The chlorinated 1-ethyl-3-methylimidazole ([Emim]Cl) ionic liquid was heated to a colorless and transparent state under a constant temperature oil bath at 60 °C, and then gallium chloride (GaCl 3 ) into the chlorinated 1-ethyl-3-methylimidazolium ionic liquid to form a gallium chloride solution; then use two parallel metal platinum as the anode and solid metal gallium as the cathode to electrodeposit the gallium chloride solution, Chlorine gas is produced on the anode, and solid gallium is precipitated on the cathode; the anode in the electrolytic cell is parallel to the surface of the cathode, and the anode and cathode are arranged in an anode-cathode-anode manner; the current density of the cathode is controlled at 5A / m 2 , the cell voltage is 3.0V, the electrode distance between the cathode and the anode is 21mm, the electrodeposition temperature is 150°C, and the electrodeposition time is 2.0h.

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PUM

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Abstract

The invention relates to a method for electrodepositing gallium at low temperature by using an ionic liquid, which comprises the following steps: heating an ionic liquid used as an electrolyte to a colorless transparent state, dissolving gallium chloride in the ionic liquid, and electrodepositing the gallium chloride in the solution, wherein gallium is generated at the cathode of the electrolytic bath, and chlorine gas is emitted at the anode. In the electrodeposition process, the bath voltage of the electrolytic bath is higher than the decomposition voltage of gallium chloride, and lower than that of the electrochemical window of the ionic liquid. The invention has the advantages of low operating temperature, low energy consumption and low apparatus corrosiveness, can greatly lower the production cost, and is environment-friendly.

Description

technical field [0001] The invention belongs to the field of chemical, chemical and metallurgy, and in particular relates to a method for using ionic liquid to electrodeposit gallium at low temperature. Background of the invention [0002] At present, there are some problems in the production of gallium by industrial electrodeposition, such as high energy consumption, unfriendly to the environment, corrosion of equipment, high cost, and environmental pollution. Contents of the invention [0003] Aiming at the deficiencies of the prior art, the invention proposes a method for using ionic liquid to electrodeposit gallium at low temperature. [0004] In order to achieve the above-mentioned technical purpose, the technical scheme adopted in the present invention is: heating the ionic liquid to a colorless and transparent state, then dissolving gallium chloride in the ionic liquid to form a gallium chloride solution; and then electrodepositing the gallium chloride solution , g...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25C1/22
CPCY02P10/234Y02P10/20
Inventor 马梅彦
Owner IRICO
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