Forming method of TiAl pipe target material in large length-diameter ratio

A large aspect ratio, tube target technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of inability to meet the quality requirements of the target material, low material utilization, and high oxygen content. Achieve overall binding, densification molding, and uniform composition effects

Active Publication Date: 2013-05-01
AEROSPACE RES INST OF MATERIAL & PROCESSING TECH +2
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Problems solved by technology

[0003] At present, domestic TiAl tube targets are mainly produced by smelting and thermal spraying technology. The smelting process can only produce TiAl tube targets with low aluminum content. If the aluminum content is higher than 50%, the material segregation is serious, and the preparation of high aspect ratio Tube target (lengt...

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  • Forming method of TiAl pipe target material in large length-diameter ratio
  • Forming method of TiAl pipe target material in large length-diameter ratio

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Embodiment Construction

[0032] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:

[0033] Taking the manufacture of a tubular TiAl target with a size of φ64×φ80×1200 mm as an example, the specific implementation of the method will be described.

[0034] Step (1), package mold design and processing, assembly

[0035] According to the shape and size of the formed TiAl tube target product, considering the shrinkage of the powder, the overall formation of the target material and the back tube, and the weldability of the sheath, the sheathing mold is designed, and the appropriate sheathing material and structure are selected. The sheath mold of the present invention comprises inner sheath 1, outer sheath 2, sheath bottom cover 3, sheath upper cover 4, air guide tube 5 and back pipe 6, as figure 1 Shown is a schematic diagram of the assembly of the sheath mold in the TiAl tube target forming method of the present invention. First, ...

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Abstract

The invention relates to a forming method of TiAl pipe target material in a large length-diameter ratio. The forming method comprises the following steps of (1) assembling of a sheath die; (2) packing and sealing welding of raw materials of Ti powder and Al powder; (3) vacuum heat degassing; (4) densification forming of hot isostatic pressure; (5) removing of the sheath die; and (6) product fine processing. According to the forming method disclosed by the invention, the structure of the sheath die is subjected to innovation design, excellent welding performance of the sheath die is ensured, the whole binding of the TiAl target material and a back pipe is realized, and segregation-free Ti and Al mixed powder which is uniform in composition is prepared through the optimization selection of raw material powder size and the vacuum material mixing; the powder packing density and the uniformity of the pipe target material are ensured by adopting a special powder packing technology; and the density and the straightness of the TiAl pipe target material after pressing forming can be ensured through optimized technological selection of the vacuum heat degassing and the densification forming.

Description

technical field [0001] The invention relates to a method for forming a TiAl tube target with a large length-to-diameter ratio, and belongs to the technical field of preparing a high-performance metal tube target for magnetron sputtering coating. Background technique [0002] With the rapid development of industries such as decorative coatings, integrated circuits, flat-panel displays, and tool surface coatings, there is an increasing demand for sputtering targets for coatings, among which TiAl targets are used in tool coatings and decorative coatings. one of the materials. At present, target products are mainly divided into planar targets and tube targets. Compared with planar targets, tube targets have the advantages of high utilization rate, good coating continuity, and uniform coating composition. They are ideal sputtering targets. The market demand huge. At present, terminal target coating manufacturers are gradually upgrading magnetron sputtering equipment, transition...

Claims

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Application Information

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IPC IPC(8): B22F3/03C23C14/35
Inventor 石刚谢飞张绪虎崔鹏崔子振黄国基
Owner AEROSPACE RES INST OF MATERIAL & PROCESSING TECH
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