Forming method of TiAl pipe target material in large length-diameter ratio

Abstract

The invention relates to a forming method of TiAl pipe target material in a large length-diameter ratio. The forming method comprises the following steps of (1) assembling of a sheath die; (2) packing and sealing welding of raw materials of Ti powder and Al powder; (3) vacuum heat degassing; (4) densification forming of hot isostatic pressure; (5) removing of the sheath die; and (6) product fine processing. According to the forming method disclosed by the invention, the structure of the sheath die is subjected to innovation design, excellent welding performance of the sheath die is ensured, the whole binding of the TiAl target material and a back pipe is realized, and segregation-free Ti and Al mixed powder which is uniform in composition is prepared through the optimization selection of raw material powder size and the vacuum material mixing; the powder packing density and the uniformity of the pipe target material are ensured by adopting a special powder packing technology; and the density and the straightness of the TiAl pipe target material after pressing forming can be ensured through optimized technological selection of the vacuum heat degassing and the densification forming.

Description

technical field [0001] The invention relates to a method for forming a TiAl tube target with a large length-to-diameter ratio, and belongs to the technical field of preparing a high-performance metal tube target for magnetron sputtering coating. Background technique [0002] With the rapid development of industries such as decorative coatings, integrated circuits, flat-panel displays, and tool surface coatings, there is an increasing demand for sputtering targets for coatings, among which TiAl targets are used in tool coatings and decorative coatings. one of the materials. At present, target products are mainly divided into planar targets and tube targets. Compared with planar targets, tube targets have the advantages of high utilization rate, good coating continuity, and uniform coating composition. They are ideal sputtering targets. The market demand huge. At present, terminal target coating manufacturers are gradually upgrading magnetron sputtering equipment, transition...

AI Technical Summary

Problems solved by technology

[0003] At present, domestic TiAl tube targets are mainly produced by smelting and thermal spraying technology. The smelting process can only produce TiAl tube targets with low aluminum content. If the aluminum content is higher than 50%, the material segregation is serious, and the preparation of high aspect ratio Tube target (length ≥ 1000mm) is difficult and low yield

The TiAl tube target material formed by spraying technology has the disadvantages of low density, low material utilization rate and high oxygen content. quality requirements

Foreign high-quality TiAl tube targets are produced by advanced magnetic levitation melting technology, but the price is expensive

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