Wafer-level packaging structure for improving response rate of thermopile infrared detector
An infrared detector, wafer-level packaging technology, applied in electrical radiation detectors, measuring devices, microstructure technology, etc. The effect of multiple losses, improved utilization, and improved response rate
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Embodiment 1
[0025] Embodiment one, such as figure 2 As shown, a thermopile infrared detector 1 includes a silicon substrate 2 , a suspension film 3 , and a cavity structure 4 , wherein the suspension film 3 contains a thermopile structure 9 .
[0026] The thermopile structure 9 is made inside the suspension membrane 3 through the existing technology, and the thermopile structure 9 is usually formed by a series of thermocouple bars connected in series. One end of the thermopile structure 9 is a hot end 7 and the other end is a cold end 8 .
[0027] An infrared anti-reflection film 6 is grown on the back of the silicon substrate 2 facing the infrared radiation source 5. In this embodiment, the infrared anti-reflection film 6 is uniformly grown on the back of the silicon substrate 2 directly by coating technology. Commonly used coating methods include vacuum evaporation, chemical phase deposition, sol-gel coating and other methods.
[0028] Then, lead electrodes 10 are drawn out on the sus...
Embodiment 2
[0031] Embodiment two, such as image 3 As shown, it is a further improvement on the basis of Embodiment 1. The infrared anti-reflection coating 6 in the corresponding area on the back of the silicon substrate 2 above the cold end 8 is removed, so that the patterned infrared light is formed on the back of the silicon substrate 2. AR coating. The patterned infrared anti-reflection film covers the back area of the silicon substrate 2 above the cavity structure 4 . The structure in other aspects is the same as in Embodiment 1. The detailed process of forming a patterned infrared anti-reflection coating is as follows:
[0032] The infrared anti-reflection film 6 is evenly grown on the back side of the silicon substrate 2 facing the infrared radiation source 5 by coating technology, and the photoresist is spin-coated on the surface of the infrared anti-reflection film of this layer, and then the anti-reflection film position needs to be removed (the cold of the thermopile The ...
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