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Photonic crystal LED (Light Emitting Diode) structure with gradually-varied refractive index

A technology of gradient refractive index and light emitting diode, applied in the field of photonic crystal light emitting diode structure, can solve problems such as energy loss, and achieve the effects of reducing light loss, improving LED light extraction efficiency, and having a significant light guiding effect

Inactive Publication Date: 2013-06-12
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the current photonic crystals are made on the surface of the material with a single structure, and the photonic band gap and grating diffraction effect at the interface are bound to be accompanied by energy loss.

Method used

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  • Photonic crystal LED (Light Emitting Diode) structure with gradually-varied refractive index

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Embodiment Construction

[0018] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0019] see figure 1 As shown, the present invention provides a photonic crystal light-emitting diode structure with graded refractive index, which includes:

[0020] A substrate 11, the material of the substrate 11 is C-plane, R-plane or A-plane aluminum oxide single crystal, 6H-SiC or 4H-SiC and single crystal oxide whose lattice constant is close to that of nitride semiconductor things.

[0021] A nucleation layer 12, the nucleation layer 12 is fabricated on the substrate 11; the nucleation layer 12 is made of gallium nitride material.

[0022] A buffer layer 13, the buffer layer 13 is fabricated on the nucleation layer 12; the buffer layer 13 is made of gallium nitride material.

[0023] An n-type contact layer 14, ...

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Abstract

The invention provides a photonic crystal LED (Light Emitting Diode) structure with a gradually-varied refractive index. The photonic crystal LED structure comprises a substrate, a nucleating layer, a buffering layer, an n-type contact layer, an active luminescent layer, a p-type electron blocking layer, a p-type contact layer, a refractive index gradual variation array type photonic crystal, a negative electrode and a positive electrode, wherein the nucleating layer is manufactured on the substrate; the buffering layer is manufactured on the nucleating layer; the n-type contact layer is manufactured on the buffering layer and a mesa is formed at one side of the n-type contact layer; the active luminescent layer is manufactured on the other side of the mesa of the n-type contact layer; the p-type electron blocking layer is manufactured on the active luminescent layer; the p-type contact layer is manufactured on the p-type electron blocking layer; the refractive index gradual variation array type photonic crystal is manufactured on the p-type contact layer; the negative electrode is manufactured on the mesa at one side of the n-type contact layer; and the positive electrode is manufactured on the refractive index gradual variation array type photonic crystal.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a photonic crystal light-emitting diode structure with a graded refractive index. Background technique [0002] At present, III-V semiconductor optoelectronic materials are known as the third generation semiconductor materials. Gallium nitride-based light-emitting diodes have become the focus of research in the industry because light-emitting diodes (referred to as "LEDs") of various colors (especially blue or violet light that require a high energy gap) can be produced by controlling the composition of materials. [0003] In addition to the internal quantum efficiency, the factors affecting LED luminescence, the light extraction efficiency also largely affects the luminous efficiency of LEDs. The light extraction efficiency of GaN-based LEDs is mainly affected by the refractive index of GaN materials. Taking the output light at 460 nanometers as an example, the effectiv...

Claims

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Application Information

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IPC IPC(8): H01L33/44
Inventor 赵玲慧马平甄爱功王军喜曾一平李晋闽
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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