Low-temperature deposition device and process for TCO film

Abstract

The invention discloses a low-temperature deposition device and process for a TCO (transparent conductive oxide) film. The device comprises at least one cathode assembly, wherein all the cathode assemblies are uniformly distributed on two sides of a substrate; each cathode assembly is independently provided with a medium-frequency power supply or a bipolar pulse power supply and comprises two sputtering cathodes; the sputtering cathodes comprise targets, cathode bodies and magnets respectively; the targets are arranged on two sides of the substrate, the cathode bodies are arranged on the outsides the targets, and a plurality of magnets which are distributed in parallel are arranged between the targets and the cathode bodies, and two ends of each magnet are connected with the targets and the cathode bodies respectively; and magnetic poles of one ends, connected with the targets, of every two adjacent magnets are opposite. The process comprises steps as follows: plasma areas are formed in the cathode assemblies respectively; the plasma areas cover sides of the substrate; electrons in the plasma areas oscillate at a high speed and continuously bombard the sides of the substrate; and a film layer deposited on the surface of the substrate is subjected to electron bombardment and surface heating treatment. According to the device and the process, TCO films of high quality are deposited at the normal temperature.

Description

technical field [0001] The invention relates to the technical field of coating of a TCO transparent conductive film, in particular to a low-temperature deposition device and process of a TCO transparent conductive film. Background technique [0002] TCO glass, that is, transparent conductive oxide coated glass, is a layer of transparent conductive oxide film uniformly coated on the surface of the flat substrate by physical or chemical coating methods, mainly including oxides of In, Sn, Zn and Cd and their Composite multi-element oxide film material. TCO glass mainly includes ITO coated glass, FTO coated glass and AZO coated glass. Among them, the development of ITO coated glass and FTO coated glass has been relatively mature. ITO coated glass has the characteristics of high light transmittance, firm film layer, and good conductivity. It is currently mostly used in the field of touch screens, but when used in solar cells, it is not stable enough in plasma, so it is not the ...

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Problems solved by technology

[0004] (1) Due to the high-temperature deposition process, the equipment needs to be equipped with a high-power heater, resulting in high power consumption and high equipment operating costs;

[0005] (2) Due to the high-temperature baking function of the equipment, a large amount of cost is increased

In addition, the existence of high temperature leads to a shortened life of the vacuum seal

Therefore, in order to reduce the failure rate of the equipment, various cooling components should be added in the equipment, which further increases the cost of the equipment;

[0006] (3) During the high-temperature heating process, the substrate will also have the problem of uneven film formation due to uneven heating, which reduces the qualified rate of the product

For glass substrates, in severe cases, the glass will be broken due to uneven high temperature, resulting in waste and equipment downtime.

[0007] (4) It is impossible to deposit high-quality transparent conductive films on the surface of heat-resistant materials (such as: PET films, etc.), which limits its application range

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