Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multilayer symmetrical metamaterial capable of generating Fano resonance enhancing phenomenon and frequency tunable phenomenon

A Fano resonance and metamaterial technology, applied in optics, instruments, electrical components, etc., can solve problems that limit the application of Fano resonance

Active Publication Date: 2013-08-21
DALIAN UNIV OF TECH
View PDF1 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are few studies on the influence of multilayer symmetric metamaterials on Fano resonance, which limits the further application of Fano resonance.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multilayer symmetrical metamaterial capable of generating Fano resonance enhancing phenomenon and frequency tunable phenomenon
  • Multilayer symmetrical metamaterial capable of generating Fano resonance enhancing phenomenon and frequency tunable phenomenon
  • Multilayer symmetrical metamaterial capable of generating Fano resonance enhancing phenomenon and frequency tunable phenomenon

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0022] First, a multilayer structure (lower metal layer 3-dielectric layer 4-upper metal layer 3-oxidation layer 5) 2 is formed on a glass substrate 1 by material growth process, as shown in the attached figure 2 (a) shown.

[0023] Second, deposit SiO on the multilayer structure 2 2 film as a mask 6, as attached figure 2 (b) shown.

[0024] Then, the designed resonant cell array is transferred to the mask through the mask process, as shown in the attached figure 2 (c) shown. Among them, the structure design can adopt algorithms such as finite time domain difference method and finite element method.

[0025] Then, through an etching process, a resonant unit array 7 is prepared on the 2 material, and the resonant unit array is arranged in a rectangular lattice (that is, on the surface of the metamaterial, the horizontal period length L of the resonant unit x and vertical cycle length L y ranging) as attached figure 2 (d) shown.

[0026] Finally, the mask 6 is remove...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a kind of multilayer symmetrical metamaterial capable of generating a Fano resonance enhancing phenomenon and a frequency tunable phenomenon. Through the fact that rectangular crystal lattice arrangement is used in a resonance cell array of the multilayer symmetrical metamaterial (namely, on the surface of the metamaterial, the cycle length of a resonance cell in the horizontal direction is not equal to the cycle length of the resonance cell in the perpendicular direction), electric dipole resonance of the multilayer symmetrical metamaterial is enhanced, the electric dipole resonance interacts with strong magnetic dipole resonance of the metamaterial, the Fano resonance phenomenon in the transmission spectrum of the metamaterial is enhanced, a steep asymmetrical harmonic peak is achieved, and therefore the technical problem that shift and intervals of resonant wave length must be far larger than the resonant cavity bandwidth is solved, and wavelength resolution of the multilayer symmetrical metamaterial and sensitivity of exploration conducted on refractive index change of living beings by the multilayer symmetrical metamaterial are improved. The Fano resonance quality factor of the structure increases along with the increase of the cycle length of the resonance cell in the horizontal direction or along with the increase of the cycle length of the resonance cell in the perpendicular direction. Meanwhile, the Fano resonance wavelength of the structure reduces along with the increase of the cycle length of the resonance cell in the horizontal direction or along with the increasing of the cycle length of the resonance cell in the perpendicular direction (blue shift), and therefore tuning of the Fano resonance can be achieved.

Description

technical field [0001] The invention relates to a multi-layer symmetrical metamaterial capable of producing Fano resonance enhancement and tunable phenomena, which can be applied to the fields of slow light, sensing, nonlinearity, optical switches and the like. Background technique [0002] Fano resonance is a kind of resonance phenomenon, which has an asymmetric spectral line shape, which can significantly improve the performance of surface plasmon functional devices. In recent years, artificial electromagnetic metamaterials have attracted widespread attention in the field of international electromagnetic science, among which Fano resonance based on artificial electromagnetic metamaterials has become a new hot spot in this field, as document 1: "B.Luk'yanchuk et al. al, NATURE MATERIAL, 2010(9): 707 "reported the discovery of Fano resonance in surface plasmon nanostructured metamaterials. In 2007, Document 2: "V.A. Fedotove et al, PHYSICAL REVIEW LETTER, 2007(99): 147701" ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01Q15/00G02B5/00
Inventor 曹暾
Owner DALIAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products