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Device for measuring flow rate and flow quantity of gas released by matter at different temperatures

A technology of gas flow rate and mass flow rate, applied in measuring devices, mass flow measuring devices, fluid velocity measurement, etc., it can solve the problems of inability to accurately control the reaction temperature of substances, measurement limitations, human errors, etc., to achieve rich functions, Test the effect of wide temperature range and short response time

Inactive Publication Date: 2013-08-28
GUILIN UNIV OF ELECTRONIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is time-consuming and labor-intensive, and there are large human errors in time recording and gas production reading, resulting in inaccurate data; due to the inability to accurately control the reaction temperature of the substance, there are also great limitations in measurement
The device used to measure the rate and amount of gas released by different substances at different temperatures has not been reported

Method used

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  • Device for measuring flow rate and flow quantity of gas released by matter at different temperatures
  • Device for measuring flow rate and flow quantity of gas released by matter at different temperatures
  • Device for measuring flow rate and flow quantity of gas released by matter at different temperatures

Examples

Experimental program
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Effect test

Embodiment 1

[0029] figure 1 It is a structural schematic diagram of an embodiment of the present invention, including a reaction tank 1, valves 2, 3, 5, 8 and 10, a pressure sensor 4, flow control valves 6 and 9, a mass flow meter 7, a vacuum pressure gauge 11 and a vacuum pump 12 And the pipeline system 13, the temperature control system 14, the feed port 15 with the valve; this embodiment designs a LaNi after hydrogenation under the condition of 80 ℃ that can measure the temperature 5 Powder Release H 2 The device of the rate and amount of release, its physical figure is shown in Figure 4 Shown, wherein the reaction tank 1 is LaNi after hydrogenation 5 Powder, mass flow meter 7 is selected to measure H 2 Dedicated, the maximum pressure 3MPa specification, the pressure sensor 4 selects the maximum range 3MPa specification, and the heating instrument adopts a temperature-controllable heater. First, the hydrogenated LaNi 5 Put the powder into the reaction tank 1, and close the feedin...

Embodiment 2

[0031] The overall link of this embodiment is the same as that of Embodiment 1, the difference is that the device adds an additional reaction tank, which can be used as a relatively large amount of gas preparation and collection device, such as image 3 shown.

Embodiment 3

[0033] The overall connection of this embodiment is the same as that of Embodiment 1, except that a refrigeration source is added to a low-temperature heat preservation container to measure the release H of a certain hydrogen storage alloy powder under low temperature conditions. 2 The rate and amount of release, such as Figure 5 shown.

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PUM

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Abstract

The invention discloses a device for measuring the flow rate and the flow quantity of gas released by matter at different temperatures. The device for measuring the flow rate and the flow quantity of the gas released by the matter at different temperatures is composed of a reaction tank, a pressure sensor, a mass flow rate instrument, a flow control valve, a valve, a vacuum manometer, a vacuum air pump, a pipeline system and a temperature control system, wherein the mass flow rate instrument can display numerical values of the gas releasing rate and the gas releasing quantity fast and accurately, the vacuum air pump can guarantee that no interference gas is left in a pipeline when a test is started by using the device, and the temperature control system can flexibly control the temperature in the reaction tank. The device can be used for measuring gas releasing rates and gas releasing quantities of different kinds of matter at different temperatures fast and can also be used as a gas preparation and collecting device and a hydrogen storage material activated device. The device for measuring the flow rate and the flow quantity of the gas released by the matter at different temperatures is safe, reliable, wide in working range, time-saving, labor-saving, accurate in measured data, high in efficiency, and capable of meeting different requirements.

Description

technical field [0001] The invention relates to a device for measuring gas velocity and flow. Background technique [0002] At present, it is necessary to measure the flow rate and flow rate of gas released by substances in many fields, such as measuring the hydrogen release rate and amount of hydrogen storage alloy powder, and measuring the rate and amount of gas released by the hydrolysis of a certain substance; these measurements are generally They are all devices that use a simple gas generation-drainage method to collect gas. By recording the gas production at different times, the gas release rate and release amount of this substance can be calculated. This method is time-consuming and labor-intensive, and there are large human errors in time recording and gas production reading, resulting in inaccurate data; due to the inability to accurately control the reaction temperature of the substance, there are also great limitations in measurement. Devices for measuring the r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01P5/00G01F1/76
Inventor 王仲民吕朋张怀刚邓健秋王凤周锦阳周怀营
Owner GUILIN UNIV OF ELECTRONIC TECH
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