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Highly scratch-resistant imprint material containing urethane compound

A compound and molecular compound technology, applied in the field of imprinting materials, to achieve the effect of enlarging the scope of the process and reducing the occurrence of damage

Inactive Publication Date: 2013-09-25
NISSAN CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

), but it can be said that there is no report of a material that can maintain high scratch resistance after performing a scratch test after making a structure such as a concave-convex pattern.

Method used

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  • Highly scratch-resistant imprint material containing urethane compound
  • Highly scratch-resistant imprint material containing urethane compound
  • Highly scratch-resistant imprint material containing urethane compound

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0129] Hereinafter, although an Example and a comparative example are given and this invention is demonstrated in detail, this invention is not limited to these Examples.

Synthetic example 1

[0131] 60.8 parts by mass of toluene and 8.4 parts by mass of stearyl alcohol (NAA-46; manufactured by NOF Co., Ltd., hydroxyl value: 207) were added to a 500 mL capacity flask equipped with a stirrer, a thermometer, and a condenser, and the temperature was raised to 40°C. Then, after confirming that the stearyl alcohol was completely dissolved, 50 parts by mass of an isocyanurate-modified type of 1,6-hexamethylene diisocyanate (Takenet (registered trademark) D-170N; manufactured by Mitsui Chemicals, Inc., NCO%: 20.9) was added. , heated up to 70°C. After reacting at the same temperature for 30 minutes, 0.02 mass parts of dibutyltin dilaurate was added, and it maintained at the same temperature for 3 hours. Then, 83.5 parts by mass of polycaprolactone-modified hydroxyethyl acrylate (Praccel (registered trademark) FA2D; manufactured by Daicel Chemical Industry Co., Ltd. (present Daicel Corporation), hydroxyl value: 163) and 0.02 mass parts of dibutyltin dilaurate were added. 0...

Synthetic example 2

[0133] 48.2 parts by mass of toluene and 4.2 parts by mass of stearyl alcohol (NAA-46) were placed in the same flask as in Synthesis Example 1, and the temperature was raised to 40°C. After confirming that stearyl alcohol was completely dissolved, 25 parts by mass of isocyanurate-modified type (Takenet (registered trademark) D-170N) of 1,6-hexamethylene diisocyanate was added, and the temperature was raised to 70°C. After reacting at the same temperature for 30 minutes, 0.02 parts by mass of dibutyltin dilaurate was added and kept at the same temperature for 3 hours. Then, 83.3 parts by mass of polycaprolactone-modified hydroxyethyl acrylate (Praccel (registered trademark) FA5; manufactured by Daicel Chemical Industry Co., Ltd. (present Daicel Corporation), hydroxyl value: 81.8) and 0.02 mass parts of dibutyltin dilaurate were added. parts, 0.02 parts by mass of hydroquinone monomethyl ether, kept at 70° C. for 3 hours, and after completion of the reaction, toluene was removed...

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PUM

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Abstract

[Problem] To provide an imprint material capable of forming a film which exhibits high scratch resistance even after a pattern has been transferred thereto, specifically, an imprint material capable of forming a film such that, when the film is patterned by transferring and then subjected to a steel wool scratch test, few scratch marks are observed. [Solution] An imprint material which comprises (A) a compound that has at least one ethylene oxide unit and at least one polymerizable group, (B) a urethane compound that has at least one long-chain alkyl group having 13 to 25 carbon atoms and at least one polymerizable group and that is modified with polycaprolactone, and (C) a photopolymerization initiator.

Description

technical field [0001] The present invention relates to embossed materials, and films produced from the materials and transferred with patterns. More specifically, it relates to an imprint material capable of forming a film having high scratch resistance even after a pattern has been transferred, and a film produced from the material and transferred with a pattern. Background technique [0002] In 1995, a new technique called nanoimprint lithography was proposed by Professor Chou of the current Princeton University (Patent Document 1). Nanoimprint lithography is a process of bringing a mold having an arbitrary pattern into contact with a substrate on which a resin film is formed, pressing the resin film, and using heat or light as an external stimulus to form a target pattern on the cured resin film. This nanoimprint lithography has the advantage of being able to perform nanoscale processing easily and inexpensively compared with conventional photolithography in the manufac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B29C59/02C08F2/50C08F290/06C08F299/02C08G18/67G02F1/1333B29K75/00
CPCB82Y10/00B82Y40/00G03F7/0002C08G18/672C08G18/4277C08F299/0492C08L2205/04C08L2205/05H01L27/14683G03F7/027G03F7/035C08G18/792H01L2924/0002H01L2924/00C08F236/22C08L75/04C08G81/00H01L31/00H01L33/00
Inventor 小林淳平首藤圭介加藤拓铃木正睦
Owner NISSAN CHEM IND LTD
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