Metal porous membrane preparation method and device based on laser shock wave effect
A metal porous and shock wave technology, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve problems such as complex processes, achieve good toughness, avoid cracking, and avoid deceleration
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Embodiment 1
[0023] The metal film 1 described in this example is a stainless steel film with a thickness of 10 μm; the hard microparticle 3 is a SiC particle with a particle size of 10 nm; the absorption layer 4 is an aluminum foil with a thickness of 100 μm; the constrained layer 5 is K9 with a thickness of 3 mm. Optical glass; high-energy pulsed laser 6 is a pulsed laser with a pulse width of 10 ns and a maximum pulse energy of 12J.
[0024] Implement a kind of metal porous film preparation method based on laser shock wave effect of the present invention to carry out the following steps:
[0025] 1) Covering the absorbing layer 4 on the surface of the constraining layer 5;
[0026] 2) covering the surface of the absorbing layer 4 with a layer of hard microparticles 3 with a thickness of about 1 μm;
[0027] 3) placing the metal thin film 1 at a position about 2 mm above the absorbing layer 4;
[0028] 4) Place the whole device in the vacuum chamber 2;
[0029] 5) The high-energy puls...
Embodiment 2
[0033] The metal film 1 described in this example is a titanium film with a thickness of 50 μm; the hard microparticle 3 is a WC particle with a particle size of 0.2 μm; the absorption layer 4 is an aluminum foil with a thickness of 100 μm; K9 optical glass; high-energy pulse laser 6 is a pulse laser with a pulse width of 20ns and a maximum pulse energy of 12J.
[0034] Implement a kind of metal porous film preparation method based on laser shock wave effect of the present invention to carry out the following steps:
[0035] 1) Covering the absorbing layer 4 on the surface of the constraining layer 5;
[0036] 2) covering the surface of the absorbing layer 4 with a layer of hard microparticles 3 with a thickness of about 1 μm;
[0037] 3) placing the metal film 1 at a position about 5 mm above the absorbing layer 4;
[0038] 4) Place the whole device in the vacuum chamber 2;
[0039] 5) The high-energy pulsed laser 6 passes through the constrained layer 5 and irradiates on ...
Embodiment 3
[0043] The metal film 1 described in this example is a nickel film with a thickness of 100 μm; the hard microparticle 3 is a SiC particle with a particle size of 10 μm; the absorption layer 4 is an aluminum foil with a thickness of 100 μm; the constrained layer 5 is K9 with a thickness of 3 mm Optical glass; high-energy pulsed laser 6 is a pulsed laser with a pulse width of 30ns and a maximum pulse energy of 12J.
[0044] Implement a kind of metal porous film preparation method based on laser shock wave effect of the present invention to carry out the following steps:
[0045] 1) Covering the absorbing layer 4 on the surface of the constraining layer 5;
[0046] 2) covering the surface of the absorbing layer 4 with a layer of hard microparticles 3 with a thickness of about 1 μm;
[0047] 3) placing the metal thin film 1 at a position about 2 mm above the absorbing layer 4;
[0048] 4) Place the whole device in the vacuum chamber 2;
[0049] 5) The high-energy pulsed laser 6...
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