Optical gate switch
A technology of optical gate switch and optical waveguide, which is applied in optics, nano optics, nonlinear optics, etc., can solve the problems of large size and gate switch instability, and achieve high stability
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no. 1 example
[0063] A preferred embodiment for forming a monolithically integrated shutter switch will be described.
[0064] In order to facilitate the growth of a quantum well structure that produces a phase modulation effect due to interband transitions, an InP substrate is used as a wafer for forming an optical integrated circuit.
[0065] After growing the InP buffer layer on the InP substrate by the molecular beam epitaxy method, it is further grown so that the number of periods of growth is suitable for the InGaAs / AlAsSb coupled double quantum well structure disclosed in detail (S.Gozu et al., Applied Physics Express , 2, 042201-1-3 (2009).) or indicates the thickness required for the quantum well structure equal to or greater than the phase modulation effect of the quantum well to function as a waveguide, after which, the upper part with a thickness of 1 μm is grown again cladding. As a material of the upper cladding layer, any one of InP, InAlAs, and GaAlAsSb is used. The multi-...
no. 2 example
[0094] In the second embodiment, an improvement is made on the basis of the basic structure of the first embodiment, that is, the propagation loss of the element is reduced for TE polarized signal light. refer to Figure 7 to explain. Figure 7 In the basic configuration diagram (see FIG. 1 ) of the present invention, a configuration for reducing loss of signal light in waveguides other than the phase modulator is shown. By phosphorus ion implantation and rapid thermal annealing, to make Figure 7 Quantum well mixing occurs outside the region of the phase modulation section 15 . The structure of the second embodiment is produced by the same method as that of the first embodiment, however, it is different in the following process. Using SiO 2 For example, a mask is formed on a region corresponding to the phase modulation portion 15 on a wafer used for fabrication of an optical integrated circuit. Next, for example, a dose of 1×10 14 ~1×10 15 / cm 2 P or As ions. The ene...
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