Solar-blind ultraviolet DBR (distributed bragg reflector) and preparation method thereof
A sun-blind zone and component gradual change technology, applied in the field of sun-blind ultraviolet DBR and its preparation, can solve the problems of lattice mismatch, difficulty in ensuring a flat and steep interface, large refractive index, etc., and achieve the goal of solving defects or cracking problems Effect
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Embodiment 1
[0031] The preparation method of the sun-blind ultraviolet DBR, the steps are:
[0032] (1) Deposit 900nm thick Al on the sapphire substrate by MOCVD method 0.5 Ga 0.5 N thin film serves as a growth template for the DBR structure;
[0033] (2) Deposit a layer of 29nm thick Al 0.74 In 0.01 Ga 0.25 N-Al 0.84 In 0.01 Ga 0.15 N-component graded layer is used as the first λ / 4 layer of DBR, λ=274nm;
[0034] (3) in Al 0.84 In 0.01 Ga 0.15 11nm Al grown on N 0.98 In 0.02 N layer and 16nm Al 0.5 Ga 0.5 The N layers together constitute the second λ / 4 layer of DBR, and the second λ / 4 layer and the first λ / 4 layer constitute a complete cycle of DBR;
[0035] (4) Continue to deposit the remaining 19 periods on the first period of the DBR to form a 20-period DBR structure.
[0036] The scanning electron microscope photo of the sun-blind ultraviolet DBR sample grown in this example based on AlInGaN / AlInN / AlGaN three-layer 20-period structure is shown in figure 2 . The sim...
Embodiment 2
[0038] The steps of this embodiment are basically the same as those of Comparative Example 1, the difference being that the number of cycles of the DBR structure is 38.
[0039] The simulation calculation results of the DBR structure reflectance spectrum in this embodiment are as follows Figure 5 As shown, the reflectance at the central wavelength of 274nm is 99%;
Embodiment 3
[0041] The steps of this embodiment are basically the same as those of Comparative Example 1, the difference being that the period number of the DBR structure is 10, and the Al 0.5 Ga 0.5 N layer thickness d 1 500nm.
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