An optical processing system and method

Abstract

An optical processing system and method. The system comprises an optical system, a bearing platform, a drive system and a control system, wherein the optical system comprises a spatial light modulator (12) which is used as a pattern generation device of the optical system, the spatial light modulator (12) is provided with several pixel units, and each pixel unit is a reflecting mirror (121). When the spatial light modulator (12) conducts pattern generation, the reflecting mirrors (121) of the pixel units participating in pattern construction are uniformly turned over at the same angle γ, so that the spatial light modulator (12) constitutes a grating structure using γ as a blazing angle. The grating structure conducts diffractive light splitting on incident light, so that the optical system obtains at least two beams of coherent light capable of forming interference. The optical system uses the coherent light to complete interference direct-writing composite photoetching, so that the resolution of ordinary laser direct-writing technology is greatly improved.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to an optical processing system and method combining interference photolithography technology and laser direct writing technology. Background technique [0002] Lithography technology is a supporting technology for micro-nano manufacturing, and its application fields widely cover many industries such as microelectronics, micro-nano optics, flat panel display and biomedicine. In emerging industries, lithography technology is regarded as an indispensable technical means in the research process of new materials and new devices, and there are urgent requirements for further improvement of lithography technology, including lithography resolution, lithography quality and Efficiency of photolithographic processing. [0003] The basic principle of lithography technology is: using the miniaturization imaging optical path, the graphics on the mask plate or spatial light modulator ar...

AI Technical Summary

Problems solved by technology

This has been achieved by liquid immersion lithography and cannot be further improved

The second is to increase the aperture angle sinθ, the difficulty lies in the design and manufacture of the lens

The numerical aperture of the ordinary projection imaging lens can reach up to 0.75 or more, and the numerical aperture of the introduced microlens and zone plate is about 0.95 (diffractive optics formasklesslithography and imaging (P71)), and the improvement of its resolution is less than 30%; 2. High numerical aperture array type The production of microlenses and zone plates is very difficult; 3. The alignment and adjustment accuracy of microlenses and zone plates with the projection imaging system is very high, not only to achieve precise alignment of the X-Y array in the horizontal plane, but also to achieve height direction The alignment of the focal plane is difficult to achieve

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