Optical processing system and method

Abstract

The invention discloses an optical processing system and method. The optical processing system comprises an optical system, a bearing platform, a driving system and a control system. The optical system comprises a spatial light modulator which is used as a pattern generation device of the optical system, the spatial light modulator is provided with a plurality of pixel units, and each pixel is a reflector. When the spatial light modulator generates a pattern, the reflectors of the pixel units which establish the pattern uniformly turn over by the same angle gamma to enable the spatial light modulator to form a grating structure with gamma as a blaze angle, the grating structure conducts light diffraction and light split on incident light to enable the optical system to obtain at least two coherent light beams which can form interference, the optical system accomplishes interference direct writing combined photoetching by means of the coherent light, and therefore the distinguishability of the ordinary laser direct writing technology is greatly improved.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to an optical processing system and method combining interference photolithography technology and laser direct writing technology. Background technique [0002] Lithography technology is a supporting technology for micro-nano manufacturing, and its application fields widely cover many industries such as microelectronics, micro-nano optics, flat panel display and biomedicine. In emerging industries, lithography technology is regarded as an indispensable technical means in the research process of new materials and new devices, and there are urgent requirements for further improvement of lithography technology, including lithography resolution, lithography quality and Efficiency of photolithographic processing. [0003] The basic principle of lithography technology is: using the miniaturization imaging optical path, the graphics on the mask plate or spatial light modulator ar...

AI Technical Summary

Problems solved by technology

This has been achieved by liquid immersion lithography and cannot be further improved

The second is to increase the aperture angle sinθ, the difficulty lies in the design and manufacture of the lens

The maximum numerical aperture of ordinary projection imaging lens can reach more than 0.75, and the maximum numerical aperture of the introduced microlens and zone plate is about 0.95 (diffractive optics for maskless lithography and imaging (P71)), and the resolution improvement is less than 30%;2 1. It is difficult to manufacture microlenses and zone plates with high numerical aperture arrays; 3. The alignment adjustment accuracy of microlenses and zone plates with the projection imaging system is very high, not only to achieve precise alignment of the X-Y array in the horizontal plane , but also to achieve the alignment of the focal plane in the height direction, it is difficult to achieve

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