A semiconductor laser with a new near-cavity surface current non-injection region structure and its manufacturing method
A laser, non-injection technology, used in semiconductor lasers, lasers, laser parts, etc., can solve the problems of serious beam divergence and lack of restrictions, and achieve the effects of simple preparation process, suppression of divergence, and improvement of COD threshold.
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[0027] The present invention will be further described below in conjunction with the accompanying drawings.
[0028] like figure 1 Shown is a schematic structural diagram of a semiconductor laser with a new near-cavity surface current non-injection region structure, which includes a substrate 1, a buffer layer 2, a lower confinement layer 3, a lower waveguide Layer 4, active layer 5 with quantum well structure, upper waveguide layer 6, second upper confinement layer 7, etch stop layer 8, first upper confinement layer 9, ohmic contact layer 10, electrical insulating medium layer 11, front Electrode 12 and back electrode 13; wherein substrate 1, buffer layer 2, lower confinement layer 3, lower waveguide layer 4, active layer 5 with quantum well structure, upper waveguide layer 6, second upper confinement layer 7, etch The stop layer 8, the first upper confinement layer 9, and the ohmic contact layer 10 are adjacent to each other from bottom to top, and the four sides of the ohm...
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