Infrared detector structure for improving spectral flatness
An infrared detector and flatness technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of unsatisfactory response flatness, not taking into account the fluctuation of infrared photons, and the influence of light field distribution in photosensitive areas, etc. Good flatness, structure and the effect of simple process
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[0033] Combine below figure 2 Specific embodiments of the present invention will be described in detail.
[0034] 1. The distance between the photosensitive area 3 and other dielectric areas 4 generally does not exceed the peak wavelength of the infrared detector response, and within the range allowed by the lithography precision and process conditions, the smaller the better.
[0035] 2. For other dielectric regions 4, in practice, the same material as that of the photosensitive region 3 is generally selected, for example, both are HgCdTe materials, and anti-reflection coatings with the same thickness and medium are grown on the surfaces of the photosensitive region 3 and other dielectric regions 4 , and then use an etching or etching process for electrical isolation. In this way, the reflection of infrared photons on the surface of the photosensitive area 3 and other medium areas 4 and the interference phenomenon between them are greatly weakened.
[0036] 3. The geometri...
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