IC chip stack package with high packaging density and good high-frequency performance and manufacturing method
A high-frequency performance, chip stacking technology, used in semiconductor/solid-state device manufacturing, electrical components, semiconductor devices, etc., can solve problems affecting high-frequency performance, restrict product packaging density, etc., to improve production efficiency and save production costs. Effect
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Embodiment 1
[0066] Wafers with bumps are thinned and diced using thick adhesive film to prevent chip bump scratches, chip warpage and double-knife scribing to prevent cracking. The thinning adopts rough grinding + fine grinding + corrosion + polishing, and The final thickness of the circle is 150μm, and the roughness of the back of the wafer is ≤0.4μm; when the wafer without bumps is thinned, the rough grinding + fine grinding + corrosion + polishing process is adopted, and the final thickness of the wafer is 100μm, and the surface roughness is ≤0.3μm . Paste a high-temperature UV film on the back of the thinned wafer with bumps and the back of the wafer without bumps, and then perform scribing, using an anti-fragmentation scribing process. Take a multi-turn QFN lead frame, use a high-temperature UV film with high-temperature baking and a device with a high-temperature UV film core, and place an IC chip without bumps on a multi-turn QFN lead frame at a temperature of 100°C Bake for 2 hou...
Embodiment 2
[0070] Wafers with bumps are thinned and diced using thick adhesive film to prevent chip bump scratches, chip warpage and double-knife scribing to prevent cracking. The thinning adopts rough grinding + fine grinding + corrosion + polishing, and The final thickness of the circle is 150 μm, and the roughness of the back surface of the wafer is ≤0.4 μm; when the wafer without bumps is thinned, the rough grinding + fine grinding + corrosion + polishing process is adopted, the final thickness of the wafer is 50 μm, and the surface roughness after thinning ≤0.3μm. Paste a high-temperature UV film on the back of the thinned wafer with bumps and the back of the wafer without bumps, and then perform scribing, using an anti-fragmentation scribing process. Use the flip-chip core loading machine to core the IC chip with bumps on the AAQFN lead frame, so that the bumps on the IC chip with bumps are bonded to the first inner pin on the AAQFN lead frame, and on the AAQFN lead frame The unde...
Embodiment 3
[0073]Wafers with bumps are thinned and diced using thick adhesive film to prevent chip bump scratches, chip warpage and double-knife scribing to prevent cracking. The thinning adopts rough grinding + fine grinding + corrosion + polishing, and The final thickness of the circle is 150μm, and the roughness of the back of the wafer is ≤0.4μm; when the wafer without bumps is thinned, the rough grinding + fine grinding + corrosion + polishing process is adopted, the final thickness of the wafer is 75μm, and the surface after thinning is rough Degree ≤ 0.3μm. Paste a high-temperature UV film on the back of the thinned wafer with bumps and the back of the wafer without bumps, and then perform scribing, using an anti-fragmentation scribing process. Use the flip-chip core loading machine to core the IC chip with bumps on the AAQFN lead frame, so that the bumps on the IC chip with bumps are bonded to the first inner pin on the AAQFN lead frame, and on the AAQFN lead frame The underfill...
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