Unlock instant, AI-driven research and patent intelligence for your innovation.

Solar battery antireflection film manufacturing method

A technology of solar cells and anti-reflection coatings, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of cell downgrade sales loss, cell sorting complexity, etc., to achieve narrower color system, reduced color difference, Effect of improving conversion efficiency

Inactive Publication Date: 2014-03-05
ZHEJIANG JINKO SOLAR CO LTD +1
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are many kinds of cell colors and appearances, resulting in the complexity of cell sorting. At the same time, some colors and appearances cannot meet customer needs, resulting in the loss of cells due to downgrade and sale.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Solar battery antireflection film manufacturing method
  • Solar battery antireflection film manufacturing method
  • Solar battery antireflection film manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1~5

[0013] Embodiment 1~5: the manufacture method of the solar cell anti-reflection film with one layer of silicon nitride film layer and one layer of silicon dioxide film layer, comprises the steps:

[0014] (1) Deposit silicon nitride film layer: place the P-type polysilicon wafer that has completed acid texturing, phosphorus diffusion and etching cleaning in the coating equipment, and pass the reaction gas NH 3 and SiH 4 , deposit a uniform silicon nitride film layer 2 on the surface of the silicon wafer; control the NH 3 and SiH 4 Gas flow rate, SiH 4 and NH 3 The flow rate ratio under the gas standard state is shown in Table 1;

[0015] (2) Deposit silicon dioxide film layer: Then pass the reaction gas into the coating equipment as N 2 O and SiH 4 , deposit a uniform silicon dioxide film layer 3 on the surface of the silicon wafer, control the SiH 4 and N 2 The flow rate of O gas and make the SiH 4 and N 2 The flow ratio of O gas under the standard state is shown in...

Embodiment 6~10

[0019] Embodiment 6~10: the manufacture method of the solar cell anti-reflection film with two layers of silicon nitride film layer and one layer of silicon dioxide film layer, comprises the steps:

[0020] (1) Deposit the first layer of silicon nitride film: place the P-type polysilicon wafer that has completed acid texturing, phosphorus diffusion and etching cleaning in the coating equipment, and pass the reaction gas NH 3 and SiH 4 , deposit a uniform silicon nitride film layer I 21 on the surface of the silicon wafer; control the NH 3 and SiH 4 Gas flow rate, SiH 4 and NH 3 The flow rate ratio under the gas standard state is shown in Table 2;

[0021] (2) Deposit the second layer of silicon nitride film: after the deposition of silicon nitride film I is completed, the reaction gas NH is introduced into the coating equipment again 3 and SiH 4 , deposit a layer of uniform silicon nitride film layer II 22 on the surface of the silicon wafer; control the NH 3 and SiH 4...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a solar battery antireflection film manufacturing method. The method comprises the specific following steps. (1) Depositing a silicon nitride film layer. A P-type polysilicon wafer which completes acid texturing, phosphorus diffusion, etching and cleaning is placed in a coating device; reactive gases of NH3 and SiH4 are injected; at least one layer of a uniform silicon nitride film layer is deposited on the surface of the silicon wafer; and a flow ratio in an SiH4 and NH3 gas standard condition is 1:1 to 40. (2) Depositing a silicon dioxide film layer. The reaction gases of N2O and SiH4in are injected into the coating device; a layer of a uniform silicon dioxide film layer is deposited on the surface of the silicon wafer; and a flow ratio in the SiH4 and N2O gas standard condition is 1: 1 to 40. According to the invention, the antireflection film layer combination method and the optimization of the antireflection film coating gas formulation are used in order to improve the antireflection strength and reduce the color aberration, and the conversion efficiency is improved; and the solar battery antireflection film manufacturing method is compatible with a conventional solar cell production line, and is suitable for the mass production.

Description

technical field [0001] The invention relates to a method for manufacturing a solar cell, in particular to a method for manufacturing an anti-reflection film for a solar cell. Background technique [0002] At present, the traditional coating technology of crystalline silicon solar cells is to coat a layer of silicon nitride anti-reflection film on the surface of crystalline silicon cells to increase light projection and improve the light utilization rate of solar cells. However, due to the limitations of coating equipment and technology, the appearance of the coated battery shows different color distributions. The common colors are whitish, light blue, blue, dark blue and bright red. There are many kinds of cell colors and appearances, resulting in the complexity of cell sorting. At the same time, some colors and appearances cannot meet customer needs, resulting in losses due to the downgrade of cells. Contents of the invention [0003] The technical problem to be solved b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L31/18H01L31/0216
CPCH01L31/02168Y02E10/50Y02P70/50
Inventor 黄纪德陈康平金浩蒋方丹
Owner ZHEJIANG JINKO SOLAR CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More