Etched diffraction grating-type wavelength division multiplexing/demultiplexing device

A technology for etching diffraction gratings and wavelength division multiplexing, which is applied in the directions of light guides, optics, instruments, etc., can solve the problems of increasing the reflectivity of the grating surface and increasing the insertion loss, so as to reduce the difficulty of the manufacturing process, reduce the insertion loss, and realize the polarization maintained effect

Active Publication Date: 2014-03-19
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF5 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, the Fresnel reflection between the grating medium and the air will also lead to an increase in insertion loss
At present, a metal film is generally coated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etched diffraction grating-type wavelength division multiplexing/demultiplexing device
  • Etched diffraction grating-type wavelength division multiplexing/demultiplexing device
  • Etched diffraction grating-type wavelength division multiplexing/demultiplexing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0026] figure 1 It is a structural schematic diagram of an etched diffraction grating type wavelength division multiplexer / demultiplexer based on a photonic crystal mirror proposed in the first embodiment of the present invention. Such as figure 1 As shown, the wavelength division multiplexer / demultiplexer includes an input waveguide 1, a plurality of output waveguides 2, a free transmission slab waveguide region 3 and an etched diffraction grating 4. Wherein, the input waveguide 1 and the output waveguide 2 are located on the same side of the free transmission slab waveguide area 3, and both are connected to the free transmission slab waveguide area 3, and the other side of the free transmission slab waveguide area 3 is...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an etched diffraction grating-type wavelength division multiplexing/demultiplexing device. The etched diffraction grating-type wavelength division multiplexing/demultiplexing device includes an input waveguide, output waveguides, a free transmission slab waveguide region and an etched diffraction gratings; the input waveguide and the output waveguides are located at the same side of the free transmission slab waveguide region and are both connected with the free transmission slab waveguide region; the other side of the free transmission slab waveguide region is connected with the etched diffraction gratings; and grating surfaces of the etched diffraction gratings are of two-dimensional photonic crystal reflector structures. According to the etched diffraction grating-type wavelength division multiplexing/demultiplexing device of the invention, the two-dimensional photonic crystal reflector structures are adopted to replace grating surfaces of conventional etched diffraction gratings, and therefore, fabrication technique difficulty of the device can be effectively reduced, and large fresnel reflection loss between a grating medium and an air interface can be effectively decreased, thereby reducing the insertion loss of the device; full reflection of a single polarization mode can be realized, and full transmission of another polarization mode can be realized, and therefore, polarization maintaining of the device is maintained.

Description

technical field [0001] The invention relates to the technical field of optical communication wavelength division multiplexing, in particular to an etching diffraction grating type wavelength division multiplexing / demultiplexing device based on a photonic crystal mirror structure. Background technique [0002] The rapid popularization of the global Internet, the rise of fiber-to-the-home and home office, so that the communication capacity of the backbone network and local area Multiplexing to improve transmission efficiency, improve multiplexing efficiency, and expand transmission capacity is an inevitable choice for realizing large-capacity, high-speed optical fiber communication. The wavelength division multiplexing / demultiplexing device is the most critical device in the wavelength division multiplexing optical fiber communication system, and it is mainly divided into two types: discrete type and planar waveguide integrated type. Arrayed waveguide gratings (Array Waveguid...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B6/124G02B6/122
Inventor 王玥张家顺安俊明吴远大王红杰李建光胡雄伟
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products