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Etchant and method of manufacturing display device using same

An etchant and weight percentage technology, applied in the field of manufacturing display equipment, can solve problems such as difficulties in subsequent processes and poor etching profiles

Active Publication Date: 2018-04-06
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unfortunately, in the case of simultaneous etching of the Ti / Cu bilayer film, the etch profile is poor, leading to difficulties in subsequent processes

Method used

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  • Etchant and method of manufacturing display device using same
  • Etchant and method of manufacturing display device using same
  • Etchant and method of manufacturing display device using same

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0060] As described in Table 1 below, the etchant of 180kg includes about 10wt.% of sodium persulfate, about 0.5wt.% of ammonium bifluoride, about 3wt.% of nitric acid, about 1.5wt.% of 5-aminotetrazole, About 1.5 wt.% sodium chloride, about 0.2 wt.% copper sulfate, about 3 wt.% acetic acid and water.

example 2

[0062] As described in Table 1 below, the etchant of 180kg includes about 15wt.% of sodium persulfate, about 0.5wt.% of ammonium bifluoride, about 2wt.% of nitric acid, about 2wt.% of 5-aminotetrazole, about 1wt.% sodium chloride, about 0.01wt.% copper sulfate, about 5wt.% acetic acid and water.

example 3

[0064] As described in Table 1 below, the etchant of 180 kg includes about 8wt.% of sodium persulfate, about 0.5wt.% of ammonium bifluoride, about 5wt.% of nitric acid, about 2.5wt.% of 5-aminotetrazole, About 1.2 wt.% sodium chloride, about 0.1 wt.% copper sulfate, about 5 wt.% acetic acid and water.

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Abstract

The invention discloses an etchant and a method for manufacturing a display device using the etchant. An etchant according to an exemplary embodiment of the present invention includes: a persulfate with a weight percentage content of about 0.5% to about 20%; a weight percentage content of about 0.01% to about 2% fluorine compound; a weight percentage content of From about 1% to about 10% mineral acids; from about 0.5% to about 5% by weight cyclic amine compounds; from about 0.1% to about 5% by weight chlorine compounds; from about 0.05% to about 5% by weight about 3% copper salt; about 0.1% to about 10% by weight organic acid or organic acid salt; and water.

Description

technical field [0001] Exemplary embodiments of the present invention relate to an etchant and a method for manufacturing a display device by using the etchant. Background technique [0002] Generally, when manufacturing a thin film transistor array panel, metal layers for gate wires and data wires are usually layered on a substrate, and thereafter, the metal layers may need to be etched. [0003] For the gate wire and the data wire, copper having good conductivity and low resistance has been used. But when copper is used, using a single copper thin film can present difficulties for the process of coating and patterning the photoresist. Therefore, a multi-layer metal thin film can be applied to the gate wires and the data wires. [0004] For example, among multilayer metal films, titanium / copper bilayer films have been widely used. Unfortunately, in the case of simultaneous etching of the Ti / Cu bilayer film, the etch profile is poor, leading to difficulties in subsequent ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/18C23F1/26H01L21/3213
Inventor 李昔准权五柄刘仁浩张尚勋朴英哲李喻珍李俊雨金相泰秦荣晙
Owner DONGWOO FINE CHEM CO LTD