A photolithography device for a high-precision grating scale mother board
A grating scale, high-precision technology, used in photolithography process exposure devices, microlithography exposure equipment, etc., can solve the problems of short scribe life, poor scribe stability, etc., to reduce contact scratches, ensure uniformity, Good shock isolation effect
Inactive Publication Date: 2015-12-09
XI AN JIAOTONG UNIV
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Problems solved by technology
[0003] The object of the present invention is to provide a high-precision grating scale master plate lithography device, which overcomes the shortcomings of the original contact type transmission glass grating master plate, which have short marking life and poor marking stability.
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[0018] Below in conjunction with accompanying drawing and embodiment the present invention is described in further detail:
[0019] see figure 1 As shown, in the proximity lithography, the mask 2 is arranged parallel to the grating scale blank 3 to be engraved, and the gap 4 needs to be guaranteed at the micron level; the mask 2 includes a transparent layer 5 and a reflective layer 6 arranged on the transparent layer 5 During photolithography, a parallel light source 1 of a certain wavelength is irradiated vertically on the mask 2 to ensure the uniformity of light energy irradiation, and complete the parallel photolithographic scribing process.
[0020] see figure 2 and image 3 As shown, a high-precision grating ruler master plate lithography device of the present invention includes a natural granite bed 7, a light source, a mask 17, a ruled grating ruler 18 and a gap adjustment structure.
[0021] A pair of parallel guide rails 8 are arranged on the natural granite bed 7...
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The invention discloses a high-accuracy grating ruler motherboard photoetching device, which comprises a bed body, a light source, a mask, an etched grating ruler and a gap regulation structure, wherein a pair of parallel guide rails is arranged on the bed body; a sliding plate is arranged on the guide rails; the light source is arranged on the sliding plate; the gap regulation structure is arranged on the side, just opposite to the light source, of the bed body; the mask and the etched grating ruler are arranged on the gap regulation structure. According to the device, the light illumination uniformity is ensured, and the mask is prevented from being scratched by contact; the device can guarantee the long service life of a motherboard, high photoetching accuracy and easiness in batch production; the processes of development, baking, corrosion, hardening, detection and the like are subsequently implemented on the basis of a parallel light photoetching process; the accuracy of a produced grating ruler motherboard can reach + / -1 micron / m.
Description
Technical field: [0001] The invention belongs to the field of optical metrology components and advanced manufacturing, and in particular relates to a photolithography device for a grating scale mother board. Background technique: [0002] The photolithography process of the grating ruler is a process of removing a specific part of the film on the surface of the coated glass through a series of production steps; after that, a film with a micro-pattern structure will be left on the surface of the coated glass; through the photolithography process, finally in the What remains on the coated glass is the characteristic graphic part. A mask is needed in the photolithography process. At present, most manufacturers in China use contact photolithography. The mask is easy to scratch during use, has a short life, and has low process reliability. Invention content: [0003] The purpose of the present invention is to provide a high-precision grating scale master lithography device, wh...
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IPC IPC(8): G03F7/20
Inventor 赵惠英任东旭陈伟席建普李彬张楚鹏范智源
Owner XI AN JIAOTONG UNIV