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A flat-plate collecting device and measuring method for measuring secondary electron emission coefficient

A secondary electron emission and collection device technology, which is applied in the direction of material analysis by measuring secondary emissions, can solve problems such as measurement difficulties, and achieve the effects of saving time for changing samples, convenient and intuitive adjustment, and improving efficiency

Active Publication Date: 2016-11-23
XI AN JIAOTONG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The secondary electron emission coefficient of metal materials is relatively easy to measure because of its own conductivity, and the dielectric material will be charged on the surface after electron bombardment, which brings difficulties to the measurement

Method used

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  • A flat-plate collecting device and measuring method for measuring secondary electron emission coefficient
  • A flat-plate collecting device and measuring method for measuring secondary electron emission coefficient

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specific Embodiment approach

[0036] The present invention will be further described in detail below in conjunction with specific examples, which are explanations of the present invention rather than limitations.

[0037] see figure 1 , a flat-plate collection device for measuring the secondary electron emission coefficient, including a sample stage 4 and a collector 2 arranged in parallel in a vacuum chamber 9, a beam spot aperture 3 is opened on the collector 2, and the electron gun 1 emits a beam passing through The electron beam of spot pinhole 3; The lower end of sample stage 4 is provided with the rotating platform 7 that is connected with rotating shaft 8, is provided with a plurality of sample placement positions on sample stage 4, and Faraday cage 6 is arranged on rotating platform 7, and sample stage The sample placement position of 4 and the Faraday cage 6 are alternately located under the beam spot aperture 3 through the rotation of the rotating platform 7; the collector 2 and the Faraday cage ...

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Abstract

The invention discloses a panel type collection device and method for measuring a secondary electron emission coefficient. A measuring device mainly comprises a rotary platform, a sample table, a heating device, a Faraday cylinder, a current amplifier and a collection electrode, wherein the inner wall of the Faraday cylinder is plated with a layer of carbon, the Faraday cylinder is connected with a bias voltage device and the current amplifier and is used for measuring a primary incidence current; the collection electrode is in a panel structure, the upper surface of the collection electrode is coated with a layer of fluorescent powder so as to conveniently adjust and focus electron beam faculae, and the lower surface of the collection electrode is plated with a layer of carbon so as to inhibit electron multiplication phenomenon in a collection process; the collection electrode is connected with a bias voltage device and the current amplifier and is used for measuring secondary electron stream emitted by the surface of a material. By utilizing a rotary device, multiple samples can be simultaneously measured, so that the measuring time is saved; by utilizing the heating device and a temperature control device, the temperature of a sample can be accurately controlled in a range of 30-300 DEG C, and the heating device and a temperature control device are used for researching the influence of the temperature on the secondary electron emission coefficient; by providing the novel electron collection device for measuring the secondary electron emission coefficient, the measurement of the secondary electron emission coefficients under different temperatures is realized.

Description

technical field [0001] The invention belongs to the technical field of measuring secondary electron emission coefficients of solid materials, and relates to a flat-plate collecting device and a measuring method for measuring secondary electron emission coefficients. Background technique [0002] The phenomenon that incident electrons bombard the surface of a solid and cause electrons to be emitted from the solid is called secondary electron emission. The ratio of the number of outgoing electrons to the number of incident electrons is called the secondary electron emission coefficient δ, which determines whether the electrostatic current flows out or flows into the solid surface. The secondary electron emission coefficient δ is related to the properties of the material and its surface state (material temperature, surface roughness, etc.), and the secondary electron emission coefficient δ of different materials varies greatly. The secondary electron emission coefficient δ is ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N23/22
Inventor 张冠军宋佰鹏穆海宝邓军波申文伟卜忍安
Owner XI AN JIAOTONG UNIV
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