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Cyclotron beam measuring device

A cyclotron and measuring device technology, which is applied in measuring devices, radiation measurement, X/γ/cosmic radiation measurement, etc., can solve problems such as difficult adjustment of stripping target current intensity, achieve quick judgment and problem solving, and improve maintenance capabilities , the effect of small investment

Active Publication Date: 2014-05-07
SHANGHAI ATOM KEXING PHARMA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Because there are only two beam measurement points for injection into the Faraday cup and the stripping target, it is difficult to distinguish whether the problem is caused by the axial injection line or the vacuum chamber, making it extremely difficult to adjust the upstream flow intensity of the stripping target

Method used

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  • Cyclotron beam measuring device
  • Cyclotron beam measuring device
  • Cyclotron beam measuring device

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Embodiment

[0022] A cyclotron beam current measurement device, the beam current measurement device is arranged on an existing cyclotron, the existing cyclotron includes an ion source and an axial injection system, an acceleration chamber and a target system, and the acceleration chamber is as figure 1 As shown, it includes a magnetic field system, a high frequency system, a peeling system, a central area, and a main vacuum system, wherein the magnetic field system includes a magnet 9 arranged in the acceleration cavity wall 8, the high frequency system includes two radio frequency D boxes 3, and two radio frequency A tuning capacitor 4 provided at one end of the D box 3, and a coupling capacitor 5 at the other end of the radio frequency D box, the coupling capacitor 5 is connected to the radio frequency final stage power amplifier 6, and the central area is provided with a central area deflection plate 1 , both sides of the deflection plate 1 in the central area are provided with symmetri...

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Abstract

The invention relates to a cyclotron beam measuring device. The beam measuring device is arranged on a cyclotron. The cyclotron comprises an ion source and axial injection system, an accelerating cavity and a target system. The accelerating cavity comprises a magnetic field system, a high-frequency system, a stripping system, a central region, and a main vacuum system. The central region is provided with a central region deflecting plate. Two sides of the central region deflecting plate are provided with symmetrical radio-frequency D boxes. The target system comprises a stripping target, a converter box, a PLC controller and a computer which are connected with the stripping target successively. The measuring device is a U-shaped copper plate. The U-shaped copper plate is arranged at the outlet of the central region deflecting plate, one end of the U-shaped copper plate is connected with the stripping target through a measuring line, signals on the stripping target are received through the converter box so as to be sent to the PLC controller and then transmitted to the computer, and the beam strength at the U-shaped copper plate is detected. Compared with the prior art, the device of the invention has advantages, such as simple and practical device, etc.

Description

technical field [0001] The invention relates to a cyclotron beam current measuring device. Background technique [0002] The existing cyclotron is a cyclotron with a fixed magnetic field and a fixed frequency that accelerates negative hydrogen ions (H-) to 30 MeV. By positioning the glass membrane at a radius corresponding to the energy requirement, the energy of the outgoing beam can be varied from 15 MeV to 30 MeV. The structure of existing cyclotron comprises three parts: (1) ion source and axial injection, ion source-deflection plate: ion source is to make neutral atom or molecular ionization, and the device that draws ion beam current therefrom, ion source has The main components are as follows: ion source arc chamber (plasma discharge chamber wall), top cover, magnetic filter, pole-absorbing device, and pole-absorbing compensation device. The line between the accelerator and the ion source is called the axial injection line. The ion beam generated in the ion source ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01T1/29
Inventor 徐建波
Owner SHANGHAI ATOM KEXING PHARMA